Atomic Layer Deposition of Defective Amorphous TiO Thin Films with Improved Photoelectrochemical Performance.

A proper control of defects in TiO thin films is challenging work for enhancing the photoelectrochemical (PEC) efficiency in water splitting processes. Additionally, a deep understanding of how defects affect the PEC performance of TiO thin films is of great interest for achieving better performance. With these aims, we prepared defective amorphous TiO thin films at various growth temperatures by atomic layer deposition using tetrakis(dimethylamido)titanium as the Ti precursor.