Publications by authors named "Emmanuel B Brousseau"
Effect of slurry composition on the chemical mechanical polishing of thin diamond films.
Sci Technol Adv Mater
September 2017
Nanocrystalline diamond (NCD) thin films grown by chemical vapour deposition have an intrinsic surface roughness, which hinders the development and performance of the films' various applications. Traditional methods of diamond polishing are not effective on NCD thin films. Films either shatter due to the combination of wafer bow and high mechanical pressures or produce uneven surfaces, which has led to the adaptation of the chemical mechanical polishing (CMP) technique for NCD films.
View Article and Find Full Text PDFArticle Synopsis
- The paper discusses the challenges of polishing diamond, a tough material, and demonstrates successful polishing of {111} and {100} single crystal diamond surfaces.
- The polishing was performed using a Logitech Tribo Chemical Mechanical Polishing system with specific compounds and a special pad.
- Notable improvements in surface smoothness were achieved, with roughness reduced significantly for both {100} and {111} diamond samples.