Unleashing the Power of 2D MoS: In Situ TEM Study of Its Potential as Diffusion Barriers in Ru Interconnects.

This study presents the utilization of MoS as a diffusion barrier for metal interconnects, in situ transmission electron microscopy (TEM) observations are employed for comprehensive understanding. The diffusion-blocking ability of MoS is discussed by the diffusion and phase transformation between Ru and Si via TEM diffraction and imaging. When the sample is heated to a high temperature such that MoS loses the ability to block the diffusion, Si diffuses through the MoS into the Ru layer, leading to the formation of RuSi.