Powering Disturb-Free Reconfigurable Computing and Tunable Analog Electronics with Dual-Port Ferroelectric FET.

Single-port ferroelectric FET (FeFET) that performs write and read operations on the same electrical gate prevents its wide application in tunable analog electronics and suffers from read disturb, especially in the high-threshold voltage () state as the retention energy barrier is reduced by the applied read bias. To address both issues, we propose to adopt a read disturb-free dual-port FeFET where the write is performed on the gate featuring a ferroelectric layer and the read is done on a separate gate featuring a nonferroelectric dielectric. Combining the unique structure and the separate read gate, read disturb is eliminated as the applied field is aligned with polarization in the high- state, thus improving its stability, while it is screened by the channel inversion charge and exerts no negative impact on the low- state stability.

Ferroelectric transistors with asymmetric double gate for memory window exceeding 12 V and disturb-free read.

Ferroelectric field-effect transistors (FeFETs) with a single gate structure and using the newly discovered ferroelectric hafnium oxide as an active material are attracting considerable interest for nonvolatile memory devices. However, such FeFETs struggle to achieve a large separation between the two logic states (memory window, MW) because of the thickness limitations of the ferroelectric film. Moreover, they are affected by detrimental disturbs coming from the read operation because of the shared write and read paths.