Spatially varying chemical phase formation on silicon nano ripple by low energy mixed ions bombardment.

We report mixed (COand N) ion beam induced spatially varying chemical phases formation on Si (100) surface in nanometer length scale. Simultaneous bombardment of carbon, oxygen and nitrogen like three reactive ions leads to well-defined ripple development and spatially varying periodic chemical phases formation. Post bombardment chemical changes of Si surface are investigated by x-ray photoelectron spectroscopy, and spatially resolved periodic variation of chemical phases are confirmed by electron energy loss spectroscopy.