Deep-WET: a deep learning-based approach for predicting DNA-binding proteins using word embedding techniques with weighted features.

DNA-binding proteins (DBPs) play a significant role in all phases of genetic processes, including DNA recombination, repair, and modification. They are often utilized in drug discovery as fundamental elements of steroids, antibiotics, and anticancer drugs. Predicting them poses the most challenging task in proteomics research.

Atomic Layer Deposition-A Versatile Toolbox for Designing/Engineering Electrodes for Advanced Supercapacitors.

Atomic layer deposition (ALD) has become the most widely used thin-film deposition technique in various fields due to its unique advantages, such as self-terminating growth, precise thickness control, and excellent deposition quality. In the energy storage domain, ALD has shown great potential for supercapacitors (SCs) by enabling the construction and surface engineering of novel electrode materials. This review aims to present a comprehensive outlook on the development, achievements, and design of advanced electrodes involving the application of ALD for realizing high-performance SCs to date, as organized in several sections of this paper.

A Novel Hybrid Approach for Classifying Osteosarcoma Using Deep Feature Extraction and Multilayer Perceptron.

Osteosarcoma is the most common type of bone cancer that tends to occur in teenagers and young adults. Due to crowded context, inter-class similarity, inter-class variation, and noise in H&E-stained (hematoxylin and eosin stain) histology tissue, pathologists frequently face difficulty in osteosarcoma tumor classification. In this paper, we introduced a hybrid framework for improving the efficiency of three types of osteosarcoma tumor (nontumor, necrosis, and viable tumor) classification by merging different types of CNN-based architectures with a multilayer perceptron (MLP) algorithm on the WSI (whole slide images) dataset.

Atomic layer deposition of tungsten sulfide using a new metal-organic precursor and HS: thin film catalyst for water splitting.

Transition metal dichalcogenides (TMDs) are extensively researched in the past few years due to their two-dimensional layered structure similar to graphite. This group of materials offers tunable optoelectronic properties depending on the number of layers and therefore have a wide range of applications. Tungsten disulfide (WS) is one of such TMDs that has been studied relatively less compared to MoS.

Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices.

We present an atomic layer deposition (ALD) process for the synthesis of tin nitride (SnN) thin films using tetrakis(dimethylamino) tin (TDMASn, Sn(NMe)) and ammonia (NH) as the precursors at low deposition temperatures (70-200 °C). This newly developed ALD scheme exhibits ideal ALD features such as self-limited film growth at 150 °C. The growth per cycle (GPC) was found to be ∼0.

Atomic Layer Deposition of Nickel Using a Heteroleptic Ni Precursor with NH and Selective Deposition on Defects of Graphene.

Atomic layer deposition (ALD) of Ni was demonstrated by introducing a novel oxygen-free heteroleptic Ni precursor, (η-cyclohexenyl)(η-cyclopentadienyl)nickel(II) [Ni(Chex)(Cp)]. For this process, non-oxygen-containing reactants (NH and H molecules) were used within a deposition temperature range of 320-340 °C. Typical ALD growth behavior was confirmed at 340 °C with a self-limiting growth rate of 1.

Revealing the Simultaneous Effects of Conductivity and Amorphous Nature of Atomic-Layer-Deposited Double-Anion-Based Zinc Oxysulfide as Superior Anodes in Na-Ion Batteries.

Although sodium-ion batteries (SIBs) are considered promising alternatives to their Li counterparts, they still suffer from challenges like slow kinetics of the sodiation process, large volume change, and inferior cycling stability. On the other hand, the presence of additional reversible conversion reactions makes the metal compounds the preferred anode materials over carbon. However, conductivity and crystallinity of such materials often play the pivotal role in this regard.

Enhanced activity of highly conformal and layered tin sulfide (SnS) prepared by atomic layer deposition (ALD) on 3D metal scaffold towards high performance supercapacitor electrode.

Layered Sn-based chalcogenides and heterostructures are widely used in batteries and photocatalysis, but its utilizations in a supercapacitor is limited by its structural instability and low conductivity. Here, SnS thin films are directly and conformally deposited on a three-dimensional (3D) Ni-foam (NF) substrate by atomic layer deposition (ALD), using tetrakis(dimethylamino)tin [TDMASn, ((CH)N)Sn] and HS that serves as an electrode for supercapacitor without any additional treatment. Two kinds of ALD-SnS films grown at 160 °C and 180 °C are investigated systematically by X-ray diffractometry, Raman spectroscopy, X-ray photoelectron spectroscopy, and transmission electron microscopy (TEM).

Atomic-Layer-Deposited MoN Thin Films on Three-Dimensional Ni Foam as Efficient Catalysts for the Electrochemical Hydrogen Evolution Reaction.

Future realization of a hydrogen-based economy requires a high-surface-area, low-cost, and robust electrocatalyst for the hydrogen evolution reaction (HER). In this study, the MoN thin layer is synthesized on to a high-surface-area three-dimensional (3D) nickel foam (NF) substrate using atomic layer deposition (ALD) for HER catalysis. MoN is grown on NF by the sequential exposure of Mo(CO) and NH at 225 °C.

Highly Uniform Atomic Layer-Deposited MoS@3D-Ni-Foam: A Novel Approach To Prepare an Electrode for Supercapacitors.

This article takes an effort to establish the potential of atomic layer deposition (ALD) technique toward the field of supercapacitors by preparing molybdenum disulfide (MoS) as its electrode. While molybdenum hexacarbonyl [Mo(CO)] serves as a novel precursor toward the low-temperature synthesis of ALD-grown MoS, HS plasma helps to deposit its polycrystalline phase at 200 °C. Several ex situ characterizations such as X-ray diffractometry (XRD), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), and so forth are performed in detail to study the as-grown MoS film on a Si/SiO substrate.

Atomic layer deposited tungsten nitride thin films as a new lithium-ion battery anode.

This article demonstrates the atomic layer deposition (ALD) of tungsten nitride using tungsten hexacarbonyl [W(CO)6] and ammonia [NH3] and its use as a lithium-ion battery anode. In situ quartz crystal microbalance (QCM), ellipsometry and X-ray reflectivity (XRR) measurements are carried out to confirm the self-limiting behaviour of the deposition. A saturated growth rate of ca.

Atomic layer deposited molybdenum nitride thin film: a promising anode material for Li ion batteries.

Molybdenum nitride (MoNx) thin films are deposited by atomic layer deposition (ALD) using molybdenum hexacarbonyl [Mo(CO)6] and ammonia [NH3] at varied temperatures. A relatively narrow ALD temperature window is observed. In situ quartz crystal microbalance (QCM) measurements reveal the self-limiting growth nature of the deposition that is further verified with ex situ spectroscopic ellipsometry and X-ray reflectivity (XRR) measurements.