Bilayer and trilayer X-ray mirror coatings containing W, Pt, or Ir, in combination with C, C/Co, BC, or BC/Ni: X-ray reflectance, film stress, and temporal stability.

X-ray reflectance and film stress were measured for 12 bilayer and trilayer reflective interference coatings and compared with a single-layer Ir coating. The interference coatings comprise a base layer of W, Pt, or Ir, top layers of either C or , and, in the case of the trilayer coatings, middle layers of either Co or Ni. The coatings were deposited by magnetron sputtering.

Monochromatic mammography using scanning multilayer X-ray mirrors.

A prototype system for breast imaging using monochromatic X-rays has been developed using a scanning multilayer X-ray mirror in combination with a conventional mammography tube and an imaging detector. The X-ray mirror produces a monochromatic fan beam tuned near 19 keV, with an energy bandpass of approximately 1.5 keV.

Pd/B4C/Y multilayer coatings for extreme ultraviolet applications near 10 nm wavelength.

A new extreme ultraviolet (EUV) multilayer coating has been developed comprising Pd and Y layers with thin B4C barrier layers at each interface, for normal incidence applications near 10 nm wavelength. Periodic, nonperiodic, and dual-stack coatings have been investigated and compared with similar structures comprising either Mo/Y or Pd/B4C bilayers. We find that Pd/B4C/Y multilayers provide higher reflectance than either Mo/Y or Pd/B4C, with much lower film stress than Pd/B4C.

Laboratory-based X-ray reflectometer for multilayer characterization in the 15-150 keV energy band.

A laboratory-based X-ray reflectometer has been developed to measure the performance of hard X-ray multilayer coatings at their operational X-ray energies and incidence angles. The instrument uses a sealed-tube X-ray source with a tungsten anode that can operate up to 160 kV to provide usable radiation in the 15-150 keV energy band. Two sets of adjustable tungsten carbide slit assemblies, spaced 4.

Extreme ultraviolet multilayer for the FERMI@Elettra free electron laser beam transport system.

In this work we present the design of a Pd/B₄C multilayer structure optimized for high reflectance at 6.67 nm. The structure has been deposited and also characterized along one year in order to investigate its temporal stability.

Capped Mo/Si multilayers with improved performance at 30.4 nm for future solar missions.

Novel capping layer structures have been deposited on periodic Mo/Si multilayers to optimize reflectance at 30.4 nm. Design, deposition and characterization of such coatings are presented.

Iridium/silicon multilayers for extreme ultraviolet applications in the 20-35 nm wavelength range.

We have developed an Ir/Si multilayer for extreme ultraviolet (EUV) applications. Normal incidence reflectance measurements of a prototype film tuned to 30 nm wavelength show superior performance relative to a conventional Mo/Si multilayer structure; we also find good stability over time. Transmission electron microscopy and electron dispersive x-ray spectroscopy have been used to examine the microstructure and interface properties of this system: we find amorphous Si layers and polycrystalline Ir layers, with asymmetric interlayer regions of mixed composition.

Performance optimization of Si/Gd extreme ultraviolet multilayers.

We compare the performance, stability and microstructure of Si/Gd multilayers containing thin barrier layers of W, B(4)C, or SiN(x), and determine that multilayers containing 0.6 nm thick W barrier layers at each interface provide the best compromise between high peak reflectance in the extreme ultraviolet near lambda=60 nm and good stability upon heating. The Si/W/Gd films have sharper interfaces and also show vastly superior thermal stability relative to Si/Gd multilayers without barrier layers.

Extreme-ultraviolet multilayer coatings with high spectral purity for solar imaging.

Future solar experiments designed to perform solar plasma diagnostics will also be based on extreme-ultravilet observations. Multilayer (ML) optics are essential in this spectral region since these coatings have high reflectivity at normal incidence. Typically, the reflectivity curve of a ML coating has a small but finite bandwidth, and this can be a serious drawback when several spectral lines fall within the bandwidth.

Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications.

We report on the performance, structure and stability of periodic multilayer films containing silicon carbide (SiC) and aluminum (Al) layers designed for use as reflective coatings in the extreme ultraviolet (EUV). We find that SiC/Al multilayers prepared by magnetron sputtering have low stress, good temporal and thermal stability, and provide good performance in the EUV, particularly for applications requiring a narrow spectral bandpass, such as monochromatic solar imaging. Transmission electron microscopy reveals amorphous SiC layers and polycrystalline Al layers having a strong <111> texture, and relatively large roughness associated with the Al crystallites.

Measurement of dysprosium optical constants in the 2-830 eV spectral range using a transmittance method, and compilation of the revised optical constants of lanthanum, terbium, neodymium, and gadolinium.

The optical constants beta, delta of the complex refractive index (ñ = 1-delta+ibeta) of Dy were obtained in the 2-830 eV energy range using a novel transmittance method. Si/W/Dy/W films were deposited by dc-magnetron sputtering on Si photodiode substrates, and the transmittance was characterized using synchrotron radiation. The extinction coefficients beta of Dy and the transmittance of a Si capping layer and two W interface barrier layers as functions of energy were solved simultaneously using a nonlinear optimization routine.

Realization and characterization of an XUV multilayer coating for attosecond pulses.

The experimental characterization of an aperiodic reflecting multilayer (ML) structure designed to reflect and compress attosecond pulses in the extreme ultraviolet spectral region is presented. The MLs are designed for the 75-105 eV spectral interval with suitable reflectance and phase behavior, in particular high total spectral reflectivity coupled with very wide bandwidth and spectral phase compensation. The experimental phase behavior of the multilayer has been obtained through electron photoemission signal using an innovative method that is presented and discussed in this paper.

High performance EUV multilayer structures insensitive to capping layer optical parameters.

We have designed and tested a-periodic multilayer structures containing protective capping layers in order to obtain improved stability with respect to any possible changes of the capping layer optical properties (due to oxidation and contamination, for example)-while simultaneously maximizing the EUV reflection efficiency for specific applications, and in particular for EUV lithography. Such coatings may be particularly useful in EUV lithographic apparatus, because they provide both high integrated photon flux and higher stability to the harsh operating environment, which can affect seriously the performance of the multilayer-coated projector system optics. In this work, an evolutive algorithm has been developed in order to design these a-periodic structures, which have been proven to have also the property of stable performance with respect to random layer thickness errors that might occur during coating deposition.

Aperiodic multilayers with enhanced reflectivity for extreme ultraviolet lithography.

We have developed novel aperiodic multilayers, covered by capping layers resistant to environmental attack, that offer superior performance for extreme ultraviolet lithography. We have designed these coatings using an optimization procedure based on an algorithm able to acquire domain knowledge inside the space of possible solutions. An integrated intensity increase of up to 2.

Normal-incidence silicon-gadolinium multilayers for imaging at 63 nm wavelength.

Si/Gd multilayers designed as narrowband reflective coatings near 63 nm were developed. The highest peak reflectance of 26.2% at a 5 degrees incident angle was obtained at 62 nm, and the spectral bandwidth was 7.

Normal-incidence reflectance of optimized W /B(4) C x-ray multilayers in the range 1.4 nm < l > 2.4 nm.

We have fabricated W/B(4)C multilayers having periods in the range d = 0.8-1.2 nm and measured their soft-x-ray performance near normal incidence in the wavelength range 1.

Atomic force microscopy characterization of Zerodur mirror substrates for the extreme ultraviolet telescopes aboard NASA's Solar Dynamics Observatory.

The high-spatial frequency roughness of a mirror operating at extreme ultraviolet (EUV) wavelengths is crucial for the reflective performance and is subject to very stringent specifications. To understand and predict mirror performance, precision metrology is required for measuring the surface roughness. Zerodur mirror substrates made by two different polishing vendors for a suite of EUV telescopes for solar physics were characterized by atomic force microscopy (AFM).

SiC/Tb and Si/Tb multilayer coatings for extreme ultraviolet solar imaging.

Narrowband SiC/Tb and Si/Tb multilayers are fabricated with as much as a 23% normal-incidence reflectance near a 60 nm wavelength and spectral bandpass (FWHM) values of 9.4 and 6.5 nm, respectively.

Terbium-based extreme ultraviolet multilayers.

We have fabricated periodic multilayers that comprise either Si/Tb or SiC/Tb bilayers, designed to operate as narrowband reflective coatings near 60 nm wavelength in the extreme ultraviolet (EUV). We find peak reflectance values in excess of 20% near normal incidence. The spectral bandpass of the best Si/Tb multilayer was measured to be 6.

Experimental comparison of extreme-ultraviolet multilayers for solar physics.

We compare the reflectance and stability of multilayers comprising either Si/Mo, Si/Mo2C, Si/B4C, Si/C, or Si/SiC bilayers, designed for use as extreme-ultraviolet (EUV) reflective coatings. The films were deposited by using magnetron sputtering and characterized by both x-ray and EUV reflectometry. We find that the new Si/SiC multilayer offers the greatest spectral selectivity at the longer wavelengths, as well as the greatest thermal stability.

Normal-incidence efficiencies of multilayer-coated laminar gratings for the extreme-ultraviolet imaging spectrometer on the solar-B mission.

The normal-incidence efficiencies of two laminar gratings and the reflectances of two parabolic mirrors with matching multilayer coatings were measured by monochromatic synchrotron radiation and were compared with modeling calculations. These optics were developed for the Extreme-Ultraviolet Imaging Spectrometer to be launched on the Japanese Solar-B mission. Each optic has two sectors coated with Mo/Si multilayers that reflect the 17-21-nm and 25-29-nm wave bands at normal incidence.

W/SiC x-ray multilayers optimized for use above 100 keV.

We have developed a new depth-graded multilayer system comprising W and SiC layers, suitable for use as hard x-ray reflective coatings operating in the energy range 100-200 keV. Grazing-incidence x-ray reflectance at E = 8 keV was used to characterize the interface widths, as well as the temporal and thermal stability in both periodic and depth-graded W/SiC structures, whereas synchrotron radiation was used to measure the hard x-ray reflectance of a depth-graded multilayer designed specifically for use in the range E approximately 150-170 keV. We have modeled the hard x-ray reflectance using newly derived optical constants, which we determined from reflectance versus incidence angle measurements also made using synchrotron radiation, in the range E = 120-180 keV.