Publications by authors named "Dara Bobb Semple"

For years, many efforts in area selective atomic layer deposition (AS-ALD) have focused on trying to achieve high-quality self-assembled monolayers (SAMs), which have been shown by a number of studies to be effective for blocking deposition. Herein, we show that in some cases where a densely packed SAM is not formed, significant ALD inhibition may still be realized. The formation of octadecylphosphonic acid (ODPA) SAMs was evaluated on four metal substrates: Cu, Co, W, and Ru.

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Area-selective atomic layer deposition (AS-ALD) is attracting increasing interest because of its ability to enable both continued dimensional scaling and accurate pattern placement for next-generation nanoelectronics. Here we report a strategy for depositing material onto three-dimensional (3D) nanostructures with topographic selectivity using an ALD process with the aid of an ultrathin hydrophobic surface layer. Using ion implantation of fluorocarbons (CFx), a hydrophobic interfacial layer is formed, which in turn causes significant retardation of nucleation during ALD.

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We report for the first time (a) the synthesis of elemental ruthenium nanowires (Ru NWs), (b) a method for modifying their surfaces with platinum (Pt), and (c) the morphology-dependent methanol oxidation reaction (MOR) performance of high-quality Pt-modified Ru NW electrocatalysts. The synthesis of our elemental Ru NWs has been accomplished utilizing a template-based method under ambient conditions. As-prepared Ru NWs are crystalline and elementally pure, maintain electrochemical properties analogous to elemental Ru, and can be generated with average diameters ranging from 44 to 280 nm.

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