Synthesis of Single Crystal LiNpO and LiNpO from Aqueous Lithium Hydroxide Solutions under Mild Hydrothermal Conditions.

The ternary oxides, LiNpO and LiNpO, were synthesized under mild hydrothermal conditions using concentrated LiOH solutions containing NpO(NO). The reactions resulted in the formation of single crystals of both compounds, enabling the determination of their single crystal structures for the first time. Exploration of the synthetic phase space demonstrates that the resulting neptunate phases are dependent on the concentration of LiOH, transitioning from LiNpO, containing a typical octahedral neptunyl geometry with two shorter Np≡O bonds, at lower LiOH concentrations to LiNpO with two long and four short Np-O bonds under saturated solution conditions.

Three Phases of Basic Zirconium and Hafnium Hydroxohalides.

Aqueous solutions of zirconium and hafnium (M) halides (X) with atomic ratios α = X/M near 1 form glasses on evaporation. Herein, we describe the preparation and properties of these glasses and discuss the nature of the crystal-glass equilibria beyond the pure glass compositions. Small- and wide-angle X-ray scattering (SWAXS) studies reveal increased polymerization as α decreases from 2 to 1.

Synthesis of an Isostructural Series of 12-Coordinate Lanthanide Nitrate Hybrid Double Perovskites with Cubic Symmetry.

In efforts to study the periodic chemical properties of the rare earth elements and their structural chemistry, a hybrid double perovskite phase AB'BX with the formula ((CH)N)KLn(NO) (Ln = La-Lu, Y ex. Pm) was synthesized that crystallizes in the cubic space group, 3̅. This series was obtained via evaporative crystallization from a mixture of Ln(NO), KNO, and (CH)N·NO in a 1:1:2 ratio from either HO or 4.

Differentiating Zr/Hf Aqueous Polyoxocation Chemistry with Peroxide Ligation.

This work complements our recent discovery of new phases derived from zirconium perchlorate by addition of hydrogen peroxide. Here, we investigate analogous reactions with hafnium perchlorate, which is found to have modifications of the Clearfield-Vaughan tetramer (CVT). For hafnium perchlorate derivatives, we find distorted versions of CVT by X-ray diffraction and study the reaction solutions by SAXS, Raman spectroscopy, and ESI-MS.

Butyltin Keggin Ion with a Rare Four-Coordinate Ca Center.

Alkyltin clusters are exploited in nanolithography for the fabrication of microelectronics. The alkyltin Keggin family is unique among Keggin clusters across the periodic table; its members appear to favor the lower-symmetry β and γ isomers rather than the highly symmetrical α and ε isomers. Therefore, the alkyltin Keggin family may provide important fundamental information about the formation and isomerization of Keggin clusters.

Peroxide-Promoted Disassembly Reassembly of Zr-Polyoxocations.

Zr/Hf aqueous-acid clusters are relevant to inorganic nanolithography, metal-organic frameworks (MOFs), catalysis, and nuclear fuel reprocessing, but only two topologies have been identified. The () polyoxocation is the ubiquitous square aqueous Zr/Hf-oxysalt of all halides (except fluoride), and prior-debated for perchlorate. Simply adding peroxide to a Zr oxyperchlorate solution leads to a striking modification of , yielding two structures identified by single-crystal X-ray diffraction.

Effect of Oxygen on Thermal and Radiation-Induced Chemistries in a Model Organotin Photoresist.

Organotin photoresists have shown promise for next-generation lithography because of their high extreme ultraviolet (EUV) absorption cross sections, their radiation sensitive chemistries, and their ability to enable high-resolution patterning. To better understand both temperature- and radiation-induced reaction mechanisms, we have studied a model EUV photoresist, which consists of a charge-neutral butyl-tin cluster. Temperature-programmed desorption (TPD) showed very little outgassing of the butyl-tin resist in ultrahigh vacuum and excellent thermal stability of the butyl groups.

Ambient-Pressure X-ray Photoelectron Spectroscopy Characterization of Radiation-Induced Chemistries of Organotin Clusters.

Advances in extreme ultraviolet (EUV) photolithography require the development of next-generation resists that allow high-volume nanomanufacturing with a single nanometer patterning resolution. Organotin-based photoresists have demonstrated nanopatterning with high resolution, high sensitivity, and low-line edge roughness. However, very little is known regarding the detailed reaction mechanisms that lead to radiation-induced solubility transitions.

Alkyltin clusters: the less symmetric Keggin isomers.

The Keggin structure is prevalent in nature and synthesis, self-assembled from many metals across the periodic table as both isolated clusters and building blocks of condensed framework oxides. Here we present a one-step synthesis to obtain the sodium-centered butyltin Keggin ion in high yield and high purity, important for mechanistic nanolithography studies. Extensive solution characterization (small-angle X-ray scattering, 1H, 13C and 119Sn nuclear magnetic resonance, electrospray mass spectrometry) also confirms solutions contain only the Na-centered dodecamers.

Alkyltin Keggin Clusters Templated by Sodium.

Dodecameric (Sn ) and hexameric topologies dominate monoalkyltin-oxo cluster chemistry. Their condensation, triggered by radiation exposure, recently produced unprecedented patterning performance in EUV lithography. A new cluster topology was crystallized from industrial n-BuSnOOH, and additional characterization techniques indicate other clusters are present.