Polymer-metal coating for high contrast SEM cross sections at the deep nanoscale.

In scanning electron microscopy (SEM), imaging nanoscale features by means of the cross-sectioning method becomes increasingly challenging with shrinking feature sizes. However, obtaining high quality images, at high magnification, is crucial for critical dimension and patterned feature evaluation. Therefore, in this work, we present a new sample preparation method for high performance cross-sectional secondary electron (SE) imaging, targeting features at the deep nanoscale and into the sub-10 nm regime.

Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features.

The next generation of hard disk drive technology for data storage densities beyond 5 Tb/in will require single-bit patterning of features with sub-10 nm dimensions by nanoimprint lithography. To address this challenge master templates are fabricated using pattern multiplication with atomic layer deposition (ALD). Sub-10 nm lithography requires a solid understanding of materials and their interactions.

Low temperature dry etching of chromium towards control at sub-5 nm dimensions.

Patterned chromium and its compounds are crucial materials for nanoscale patterning and chromium based devices. Here we investigate how temperature can be used to control chromium etching using chlorine/oxygen gas mixtures. Oxygen/chlorine ratios between 0% and 100% and temperatures between -100 °C and +40 °C are studied.