A New Quantitative Triage System for Hospitalized Neonates to Assist with Decisions of Hospital Evacuation Priorities.

Introduction: Hospitalized neonates are vulnerable to natural and man-made disasters because of their persistent requirement for medical resources and may need to be evacuated to safe locations when electricity and medical gas supply become unreliable. In Japan, a triage system for hospitalized neonates, or the Simple Triage and Rapid Treatment for Neonates, Revised (START-Neo-R), has been used to determine whether neonates are in suitable conditions for transportation. However, this scale is not useful to determine the evacuation order of neonates because a considerable number of evacuees are classified into the same categories.

Subwavelength resist patterning using interference exposure with a deep ultraviolet grating mask: Bragg angle incidence versus normal incidence.

Interference lithography using a deep-ultraviolet (DUV) laser is instrumental in the manufacture of subwavelength patterns used at visible wavelengths. We investigated a grating mask strategy for exposure in terms of how to set and illuminate masks. To obtain high aspect ratio patterns, high fringe visibility, and high exposure uniformity are essential, and for that purpose the use of only two beams with liquid immersion is necessary but not sufficient.

High-efficiency diffractive beam splitters surface-structured on submicrometer scale using deep-UV interference lithography.

We report highly efficient diffractive beam splitters intended for high-power laser applications. Submicron relief structures that work as an antireflective layer are formed on the surfaces of a splitter to improve its transmitted efficiency. Surface structuring is performed using deep-UV interference lithography and reactive ion etching.