Fluorine and Bromine Dual-Doped Nanoporous Carbons: Preparation and Surface Chemistry Studies.

A novel method for the concurrent introduction of fluorine and bromine into the surface of nanoporous activated carbon (NAC) is evaluated. According to the method, the preheated NAC was treated with 1,2-dibromotetrafluoroethane at elevated temperatures (400-800 °C). Potentiometric and elemental analysis, nitrogen adsorption-desorption, scanning electron microscopy-energy-dispersive X-ray spectroscopy, X-ray photoelectron spectroscopy (XPS), and F solid-state NMR were used to study the NAC microstructure and changes in surface chemistry.

Surface chemistry and catalytic activity in HO decomposition of pyrolytically fluoralkylated activated carbons.

According to the proposed pyrolytic method, granular activated carbon (AC) Norit 830 W was functionalized by thermal treatment of AC in hydrofluorocarbon (HFC) gases, pentafluoroethane and 1,1,1,2-tetrafluoroethane, at 400-800 °C. This method does not require activation by plasma and photons. Chemical and elemental analysis showed that the pyrolytic treatment provides a loading of 2.

Photo- and Radiofrequency-Induced Heating of Photoluminescent Colloidal Carbon Dots.

Nitrogen- and oxygen-containing carbon nanoparticles (O, N-CDs) were prepared by a facile one-step solvothermal method using urea and citric acid precursors. This method is cost-effective and easily scalable, and the resulting O, N-CDs can be used without additional functionalization and sample pretreatment. The structure of O, N-CDs was characterized by TEM, AFM, Raman, UV-vis, and FTIR spectroscopies.

Surface deep profile synchrotron studies of mechanically modified top-down silicon nanowires array using ultrasoft X-ray absorption near edge structure spectroscopy.

Atomic, electronic structure and composition of top-down metal-assisted wet-chemically etched silicon nanowires were studied by synchrotron radiation based X-ray absorption near edge structure technique. Local surrounding of the silicon and oxygen atoms in silicon nanowires array was studied on as-prepared nanostructured surfaces (atop part of nanowires) and their bulk part after, first time applied, in-situ mechanical removal atop part of the formed silicon nanowires. Silicon suboxides together with disturbed silicon dioxide were found in the composition of the formed arrays that affects the electronic structure of silicon nanowires.