Low-temperature ion beam sputtered optical coatings.

In thin film deposition processes, the lower limit of the deposition temperature is determined by the used coating technology and the duration of the coating process and is usually higher than room temperature. Hence, the processing of thermally sensitive materials and the adjustability of thin film morphology are limited. In consequence, for factual low-temperature deposition processes, an active cooling of the substrate is required.

Plasma-Enhanced Atomic Layer Deposition of HfO with Substrate Biasing: Thin Films for High-Reflective Mirrors.

Tuning ion energies in plasma-enhanced atomic layer deposition (PEALD) processes enables fine control over the material properties of functional coatings. The growth, structural, mechanical, and optical properties of HfO thin films are presented in detail toward photonic applications. The influence of the film thickness and bias value on the properties of HfO thin films deposited at 100 °C using tetrakis(dimethylamino)hafnium (TDMAH) and oxygen plasma using substrate biasing is systematically analyzed.

Creating Airy beams employing a transmissive spatial light modulator.

We present a detailed study of two novel methods for shaping the light optical wavefront by employing a transmissive spatial light modulator (SLM). Conventionally, optical Airy beams are created by employing SLMs in the so-called all-phase mode. In the first method, a numerically simulated lens phase distribution is loaded directly onto the SLM, together with the cubic phase distribution.