Hybrid III-V-on-SOI optical spot size converter by self-aligned selective undercut dry etching of Si.

A technology called self-aligned selective undercut dry etching processing has been demonstrated for fabricating a highly efficient hybrid optical spot size converter (SSC) on a Si-on-insulator (SOI) template. The process was based on a bonded wafer between the upper InP-based multiple quantum well heterostructure and the lower SOI substrate. After defining the mask on the upper InP-based ridge waveguide, / dry reactive ion etching was then used for selective undercut etching of the Si material from the surrounding materials, forming a vertical waveguide coupler of the optical SSC.

Four-wave-mixing in the loss low submicrometer Ta₂O₅ channel waveguide.

A degenerate four-wave-mixing (FWM) operation in the Ta2O5 submicrometer channel waveguide has been successfully demonstrated. The propagation loss of 1.5  dB/cm and total insertion loss of 5.