Correction: EUV photofragmentation study of hybrid nonchemically amplified resists containing antimony as an absorption enhancer.

[This corrects the article DOI: 10.1039/C7RA12934C.].

EUV photofragmentation study of hybrid nonchemically amplified resists containing antimony as an absorption enhancer.

A detailed investigation to understand the mechanism of the resist action at a fundamental level is essential for future Extreme Ultraviolet Lithography (EUVL) resists. The photodynamics study of a newly developed hybrid nonchemically amplified 2.15%-MAPDSA-MAPDST resist using synchrotron radiation excitation at 103.