Microstructure and electrical property of TiNx films deposited by DC reactive magnetron sputtering superimposed electromagnetic field system.

TiNx films were successfully deposited by DC reactive magnetron sputtering superimposed EMF system without substrate heating. In case of DCMS 400 W+ EMF 25 W, electrical property, reflectance and crystallinity of the TiN films were clearly improved by the enhancement of nitrification. The lowest sheet resistance of 2.