Ultrathin three-dimensional topological insulator films, specifically (BiSb)Se, show high potential for field effect devices due to their unique properties.
These films were fabricated on SrTiO substrates and exhibited a remarkable resistance change of approximately 25,000% when influenced by back gate voltage.
The significant ON/OFF ratio is attributed to a combination of Sb-doping and reduced film thickness, suggesting possibilities for advanced spin transistors based on topological insulators.