Initiated chemical vapor deposition and light-responsive cross-linking of poly(vinyl cinnamate) thin films.

The first vapor-phase deposition of poly(vinyl cinnamate) (PVCin) is reported. Initiated chemical vapor deposition (iCVD) is used to synthesize PVCin thin films with an average thickness of 100 nm. Free radical polymerization and cyclization reactions compete during the deposition process, with approximately 45% of the repeat units undergoing cyclization.

Closed batch initiated chemical vapor deposition of ultrathin, functional, and conformal polymer films.

A modified fabrication process based on initiated chemical vapor deposition (iCVD) has been developed for producing ultrathin and uniform polymer films. This so-called "closed batch" (CB) iCVD process provides fine-tuning of the thickness and deposition rate of polymeric materials while using significantly less reactant material than the conventional continuous flow (CF) iCVD process. Four different polymers, poly(N-isopropylacrylamide), poly(trivinyltrimethylcyclotrisiloxane), poly(1H,1H,2H,2H-perfluorodecyl acrylate), and poly(ε-caprolactone), were synthesized by both CB and traditional CF iCVD.

25th anniversary article: CVD polymers: a new paradigm for surface modification and device fabrication.

Well-adhered, conformal, thin (<100 nm) coatings can easily be obtained by chemical vapor deposition (CVD) for a variety of technological applications. Room temperature modification with functional polymers can be achieved on virtually any substrate: organic, inorganic, rigid, flexible, planar, three-dimensional, dense, or porous. In CVD polymerization, the monomer(s) are delivered to the surface through the vapor phase and then undergo simultaneous polymerization and thin film formation.

Initiated chemical vapor deposition-based method for patterning polymer and metal microstructures on curved substrates.

A simple, efficient, and scalable method for patterning microstructures on curved substrates is demonstrated. Initiated chemical vapor deposition is used to synthesize a thin film that crosslinks upon UV exposure. Polymeric features are defined on glass rods with high curvature and used as masks for metal patterning.

Chemical vapor deposition of conformal, functional, and responsive polymer films.

Chemical vapor deposition (CVD) polymerization utilizes the delivery of vapor-phase monomers to form chemically well-defined polymeric films directly on the surface of a substrate. CVD polymers are desirable as conformal surface modification layers exhibiting strong retention of organic functional groups, and, in some cases, are responsive to external stimuli. Traditional wet-chemical chain- and step-growth mechanisms guide the development of new heterogeneous CVD polymerization techniques.