Matrix isolation infrared observation of HxSi(N2)y (x = 0, 1, 2 and y = 1, 2) transient species using a 121-nm vacuum ultraviolet photolysis source.

Vacuum ultraviolet photolysis (121.6 nm) of silane in a nitrogen matrix at 12 K leads to the observation of several transient species, which have been characterized using Fourier transform infrared spectroscopy. Four transient species containing silicon and nitrogen have been observed (SiN2, Si(N2)2, HSiN2, and H2SiN2), and one transient species containing only silicon and hydrogen has been observed.