Effects of interface-engineering on the internal structure and reflective characteristics of Cr/Sc multilayer mirrors.

Record reflectivity's of R=23.8% at 3.14 nm and R=30.

The diamond-silicon carbide composite Skeleton as a promising material for substrates of intense X-ray beam optics.

The paper considers the possibility of using the diamond-silicon carbide composite Skeleton with a technological coating of polycrystalline silicon as a substrate for X-ray mirrors used with powerful synchrotron radiation sources (third+ and fourth generation). Samples were studied after polishing to provide the following surface parameters: root-mean-square flatness ≃ 50 nm, micro-roughness on the frame 2 µm × 2 µm σ ≃ 0.15 nm.

Stress, reflectance, and stability of Ru/Be multilayer coatings with Mo interlayers near the 11 nm wavelength.

The stress, reflectance, and temporal stability of Ru/Be multilayer mirrors, both with and without Mo interlayers, were studied. A Ru/Be MLM was found to have zero stress at a Ru layer thickness-to-period ratio of γ ∼ 0.4.

Investigation of structural and reflective characteristics of short-period Mo/BC multilayer X-ray mirrors.

The results of a study of the structural and reflective characteristics of short-period multilayer X-ray mirrors based on Mo/BC at wavelengths 1.54 Å, 9.89 Å and 17.

EUV telescope for a Cubesat nanosatellite.

This paper describes in detail a compact (2U format) telescope operating in the extreme ultraviolet range for studying the solar corona at a wavelength of 17.14 nm. The telescope objective has been built according to the Ritchey-Chrétien scheme with the following parameters: effective focal length of 381.

Be/Si/Al multilayer mirrors as the most promising optical elements for spectroscopy and imaging in the spectral region of 17-32 nm.

The reflective and structural parameters of Be/Si/Al multilayer mirrors have been studied. The extent of stability of their X-ray optical characteristics has been demonstrated during storage in air for 4 years and during vacuum annealing at temperatures up to 100°C. A high reflectance of 62.

A concept of "materials" diffraction and imaging beamline for SKIF: Siberian circular photon source.

Over the next decade, the extremely brilliant fourth generation synchrotron radiation sources are set to become a key driving force in materials characterization and technology development. In this study, we present a conceptual design of a versatile "Materia" diffraction and imaging beamline for a low-emittance synchrotron radiation facility. The beamline was optimized for operation with three main principal delivery regimes: parallel collimated beam ∼1 mm beam size, micro-focus regime with ∼10 μm beam spot size on the sample, and nano-focus regime with <100 nm focus.

Correction: Depth-resolved oxidational studies of Be/Al periodic multilayers investigated by X-ray photoelectron spectroscopy.

Correction for 'Depth-resolved oxidational studies of Be/Al periodic multilayers investigated by X-ray photoelectron spectroscopy' by Niranjan Kumar , , 2023, , 1205-1213, https://doi.org/10.1039/D2CP04778K.

Axisymmetric surface shape correction of optical elements by a wide-aperture ion beam.

Methods for calculating the process of axisymmetric surface shape correction with a wide-aperture ion beam through a forming diaphragm for optical elements with a round and arbitrary border shape are presented. In the case of circular optical elements, an approach based on the separation of the axisymmetric component of the surface shape error from its decomposition by Zernike polynomials is used. In the case of optical elements with an arbitrary border shape (not round), an algorithm for searching the axisymmetric component of the shape error is proposed.

High-aperture EUV microscope using multilayer mirrors and a 3D reconstruction algorithm based on z-tomography.

The article is devoted to the development of an EUV microscope using a wavelength of 13.84 nm. Due to the use of a mirror lens with a large numerical aperture, NA = 0.

Influence of Mo interlayers on the microstructure of layers and reflective characteristics of Ru/Be multilayer mirrors.

The influence of Mo interlayers on the microstructure of films and boundaries, and the reflective characteristics of Ru/Be multilayer mirrors (MLM) were studied by X-ray reflectometry and diffractometry, and secondary ion mass spectrometry (SIMS). An increase in the reflection coefficients of MLM at a wavelength of 11.4 nm to record values of R = 72.

Depth-resolved oxidational studies of Be/Al periodic multilayers investigated by X-ray photoelectron spectroscopy.

The quantification of surface and subsurface oxidation of Be/Al periodic multilayer mirrors due to exposure in the ambient atmosphere was investigated by depth-resolved X-ray photoelectron spectroscopy. The contribution of oxidation was lower for the thicker layer of Al in the periodic structures since the surface was less chemically reactive for the oxidation. This was investigated by finding the depth-resolved slope of the intensity ratio of metal/oxides (Be/BeO and Al/AlO) by analyzing the chemical shift of Al 1s and Be 1s photoelectrons.

Highly reflective Ru/Y multilayer mirrors for the spectral range of 9-11 nm.

The results of the investigation of the reflective characteristics of multilayer mirrors based on Ru/Y are presented. Reflection coefficients at the level of 38.5% at an operating wavelength of 9.

Highly reflective Ru/Sr multilayer mirrors for wavelengths 9-12 nm.

The results of investigations of Ru/Sr multilayer coatings optimized for the spectral range of 9-12 nm are presented in this Letter. Such mirrors are promising optical elements for solar astronomy and for the development of beyond extreme ultraviolet (BEUV) lithography. A near-normal incidence reflectivity of up to 62.

High-aperture low-coherence interferometer with a diffraction reference wave.

A high-aperture low-coherence interferometer with a diffraction reference wave based on a tipped single-mode optical fiber was proposed and investigated. Due to the usage of the central least-aberrated region of the diffracted wavefront, the interferometer comprise record working aperture among known PDIs. The interferometer makes it possible to study samples with a reflectance that varies over a wide range.

A volume plasmon blueshift in thin silicon films embedded within Be/Si periodic multilayer mirrors.

Microstructural properties of the beryllium (Be) and silicon (Si) in periodic multilayer mirrors Be/Si with the variation of film thickness were comprehensively determined by Raman scattering. For the thinner films, the structure of Be evolved in the amorphous phase, and it was transformed into the polycrystalline phase for thicker films. The Si films in the periodic structure were condensed into the amorphous phase.

Influence of ion-beam etching by Ar ions with an energy of 200-1000 eV on the roughness and sputtering yield of a single-crystal silicon surface.

The behavior of sputtering yield and the surface roughness of monocrystalline silicon of orientations ⟨100⟩, ⟨110⟩, and ⟨111⟩ under the ion-beam bombardment by neutralized Ar ions with energies of 200-1000 eV is studied. The significant dependence (modulation) of sputtering yield on incidence angle due to crystalline structure is observed. It is shown that a sharp increase in the sputtering yield and a decrease in the effective surface roughness at energies above 400 eV occurs.

Effect of annealing on the interface formation in Mo/Be multilayer structures without/with a barrier layer.

In the present paper, the formation of an interface region in the multilayer periodic Mo/Be structure with/without a BC or Si barrier layer depending on the annealing conditions was studied using X-ray photoelectron spectroscopy. The formation of different beryllides at the interfaces Be-on-Mo and Mo-on-Be was explained by the impact of the deposition-induced exchange caused by ballistic collisions and surface free energy. The influence of the high temperatures on the thermal stability of Mo/Be multilayer systems without/with a barrier layer was studied.

Phase analysis of tungsten and phonon behavior of beryllium layers in W/Be periodic multilayers.

In periodic W/Be multilayers, thickness-dependent microstructural and phase modifications were investigated in W and Be layers. In X-ray diffraction, α-W was predominant for the ultrathin layer of W, while β-W evolved along with the α-W phase for higher film thickness. For the thicker layers, the thermodynamically metastable β-W vanished and a single well-defined preferably oriented stable α-W phase was observed.

Phonon, plasmon and electronic properties of surfaces and interfaces of periodic W/Si and Si/W multilayers.

The phonon and plasmon excitations and electronic properties of interfaces of periodic W/Si and Si/W multilayer structures were investigated. The Boson band originated from quasilocal surface acoustic phonons for ultrathin Si layers, excited by Raman scattering. In confined Si layers, a small fraction of crystalline Si nanoclusters were embedded within a large volume fraction of amorphous Si (a-Si) nanoclusters.

Inhibition of chemical interaction of molybdenum and silicon in a Mo/Si multilayer structure by the formation of intermediate compounds.

In the present study, the formation of intermediate compounds in the Mo/Si multilayer was realized by the introduction of barrier layers at the interfaces. Their impact on the interdiffusion of Mo and Si was analyzed via X-ray photoelectron spectroscopy. It was established that the insertion of a thin Be barrier layer led to the formation of beryllide MoBe12 at the interface Si-on-Mo, which prevented the formation of molybdenum disilicide and improved the interface.

Reflecting properties of narrowband Si/Al/Sc multilayer mirrors at 58.4 nm.

This study considers the reflective characteristics of three-component Si/Al/Sc multilayer mirrors with a protective cap layer as candidates for telescopes for observation of the solar corona in the He I (=58.4) spectral line. At 58.

High-resolution laboratory reflectometer for the study of x-ray optical elements in the soft and extreme ultraviolet wavelength ranges.

A high-resolution laboratory reflectometer designed for operation in the soft x-ray (SXR) and extreme ultraviolet (EUV) ranges is described. High spectral resolution, up to 0.028 nm, in a wide spectral range is achieved due to the Czerny-Turner monochromator.

Optical constants of sputtered beryllium thin films determined from photoabsorption measurements in the spectral range 20.4-250 eV.

In this work, the refractive index of beryllium in the photon energy range 20.4-250 eV was experimentally determined. The initial data include measurements of the transmittance of two free-standing Be films with thicknesses of 70 nm and 152 nm, as well as reflectometric measurements of similar films on a substrate.