Room-Temperature Fabrication of p-Type SnO Semiconductors Using Ion-Beam-Assisted Deposition.

Over the past decade, SnO has been considered a promising p-type oxide semiconductor. However, achieving high mobility in the fabrication of p-type SnO films is still highly dependent on the post-annealing procedure, which is often used to make SnO, due to its metastable nature, readily convertible to SnO and/or intermediate phases. This paper demonstrates a fully room-temperature fabrication of p-type SnO thin films using ion-beam-assisted deposition.