We demonstrate GeSn p-channel gate-all-around field-effect transistors (p-GAAFETs) with sub-3 nm nanowire width () on a GeSn-on-insulator (GeSnOI) substrate using a top-down fabrication process. Thanks to the excellent gate control by employing an aggressively scaled nanowire structure, GeSn p-GAAFETs exhibit a small subthreshold swing (SS) of 66 mV/decade, a decent on-current/off-current (/) ratio of ∼1.2 × 10, and a high-field effective hole mobility () of ∼115 cm/(V s).
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