Purpose: We aimed to evaluate the efficacy of moderate doses of bevacizumab in combination with TAS-102 for the treatment of refractory metastatic colorectal cancer.
Methods: A total of 261 patients with refractory mCRC were enrolled and categorized into two groups: TAS-102 combined with bevacizumab and TAS-102 alone. Patients in the bevacizumab combination group were divided into two subgroups based on a median dose of 3.
Weng, Y-H, Huang, T-S, Chang, C-Y, Yang, J-L, Chen, W-S, and Lin, J-J. Soft tissue glenohumeral internal rotation deficit revealed detailed musculoskeletal factors of baseball players. J Strength Cond Res XX(X): 000-000, 2024-Glenohumeral internal rotation deficit (GIRD) remains contentious regarding its role in shoulder injuries.
View Article and Find Full Text PDFADP-ribosylation is a highly dynamic and fully reversible post-translational modification performed by poly(ADP-ribose) polymerases (PARPs) that modulates protein function, abundance, localization and turnover. Here we show that influenza A virus infection causes a rapid and dramatic upregulation of global ADP-ribosylation that inhibits viral replication. Mass spectrometry defined for the first time the global ADP-ribosylome during infection, creating an infection-specific profile with almost 4,300 modification sites on ~1,080 host proteins, as well as over 100 modification sites on viral proteins.
View Article and Find Full Text PDFBackground: Lymph node skip metastasis is a subgroup of lymph node metastatic patterns with low incidence in node-positive colon cancer. Its clinical significance is still unclear.
Objective: This study aimed to investigate the prognostic impact of lymph node skip metastasis in stage III colon cancer.
Micromachines (Basel)
October 2022
Chemical mechanical polishing (CMP) is a well-known technology that can produce surfaces with outstanding global planarization without subsurface damage. A good CMP process for Silicon Carbide (SiC) requires a balanced interaction between SiC surface oxidation and the oxide layer removal. The oxidants in the CMP slurry control the surface oxidation efficiency, while the polishing mechanical force comes from the abrasive particles in the CMP slurry and the pad asperity, which is attributed to the unique pad structure and diamond conditioning.
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