Thermal atomic layer deposition of ErO films from a volatile, thermally stable enaminolate precursor.

Thin films of ErO films were grown by atomic layer deposition using the Er precursor tris(1-(dimethylamino)-3,3-dimethylbut-1-en-2-olate)erbium(III) (Er(L)), with water as the co-reactant. Saturative, self-limited growth was observed at a substrate temperature of 200 °C for pulse lengths of ≥4.0 s for Er(L) and ≥0.

Thermal atomic layer deposition of rhenium nitride and rhenium metal thin films using methyltrioxorhenium.

The growth of rhenium nitride and rhenium metal thin films is presented using atomic layer deposition (ALD) with the precursors methyltrioxorhenium and 1,1-dimethylhydrazine. Saturative, self-limiting growth was determined at 340 °C for pulse times of ≥4.0 s for methyltrioxorhenium and ≥0.

Aluminum dihydride complexes and their unexpected application in atomic layer deposition of titanium carbonitride films.

Aluminum dihydride complexes containing amido-amine ligands were synthesized and evaluated as potential reducing precursors for thermal atomic layer deposition (ALD). Highly volatile monomeric complexes AlH2(tBuNCH2CH2NMe2) and AlH2(tBuNCH2CH2NC4H8) are more thermally stable than common Al hydride thin film precursors such as AlH3(NMe3). ALD film growth experiments using TiCl4 and AlH2(tBuNCH2CH2NMe2) produced titanium carbonitride films with a high growth rate of 1.

Low Temperature, Selective Atomic Layer Deposition of Nickel Metal Thin Films.

We report the growth of nickel metal films by atomic layer deposition (ALD) employing bis(1,4-di- tert-butyl-1,3-diazadienyl)nickel and tert-butylamine as the precursors. A range of metal and insulating substrates were explored. An initial deposition study was carried out on platinum substrates.

Substrate selectivity in the low temperature atomic layer deposition of cobalt metal films from bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and formic acid.

The initial stages of cobalt metal growth by atomic layer deposition are described using the precursors bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and formic acid. Ruthenium, platinum, copper, Si(100), Si-H, SiO, and carbon-doped oxide substrates were used with a growth temperature of 180 °C. On platinum and copper, plots of thickness versus number of growth cycles were linear between 25 and 250 cycles, with growth rates of 0.

Highly Energetic, Low Sensitivity Aromatic Peroxy Acids.

The synthesis, structure, and energetic materials properties of a series of aromatic peroxy acid compounds are described. Benzene-1,3,5-tris(carboperoxoic) acid is a highly sensitive primary energetic material, with impact and friction sensitivities similar to those of triacetone triperoxide. By contrast, benzene-1,4-bis(carboperoxoic) acid, 4-nitrobenzoperoxoic acid, and 3,5-dinitrobenzoperoxoic acid are much less sensitive, with impact and friction sensitivities close to those of the secondary energetic material 2,4,6-trinitrotoluene.

Less sensitive oxygen-rich organic peroxides containing geminal hydroperoxy groups.

A series of oxygen-rich organic peroxide compounds each containing two bis(hydroperoxy)methylene groups is described. Energetic testing shows that these compounds are much less sensitive toward impact and friction than existing classes of organic peroxides. The compounds are highly energetic, which may lead to practical peroxide-based explosives.

Reductive elimination of hypersilyl halides from zinc(II) complexes. Implications for electropositive metal thin film growth.

Treatment of Zn(Si(SiMe3)3)2 with ZnX2 (X = Cl, Br, I) in tetrahydrofuran (THF) at 23 °C afforded [Zn(Si(SiMe3)3)X(THF)]2 in 83-99% yield. X-ray crystal structures revealed dimeric structures with Zn2X2 cores. Thermogravimetric analyses of [Zn(Si(SiMe3)3)X(THF)]2 demonstrated a loss of coordinated THF between 50 and 155 °C and then single-step weight losses between 200 and 275 °C.

Volatile and thermally stable mid to late transition metal complexes containing α-imino alkoxide ligands, a new strongly reducing coreagent, and thermal atomic layer deposition of Ni, Co, Fe, and Cr metal films.

Treatment of MCl2 (M = Cu, Ni, Co, Fe, Mn, Cr) with 2 equiv of α-imino alkoxide salts K(RR'COCNtBu) (R = Me, tBu; R' = iPr, tBu) afforded M(RR'COCNtBu)2 or [Mn(RR'COCNtBu)2]2 in 9-75% yields. These complexes combine volatility and high thermal stability and have useful atomic layer deposition (ALD) precursor properties. Solution reactions between Ni, Co, and Mn complexes showed that BH3(NHMe2) can reduce all to metal powders.

Synthesis, structure, and solution reduction reactions of volatile and thermally stable mid to late first row transition metal complexes containing hydrazonate ligands.

Treatment of MCl2 (M = Ni, Co, Fe, Mn, Cr) with 2 equiv of the hydrazonate salts K(tBuNNCHCtBuO), K(tBuNNCHCiPrO), or K(tBuNNCMeCMeO) afforded the complexes M(tBuNNCHCtBuO)2 (M = Ni, 65%; Co, 80%; Fe, 83%; Mn, 68%; Cr, 64%), M(tBuNNCHCiPrO)2 (M = Ni, 63%; Co, 86%; Fe, 75%), and M(tBuNNCMeCMeO)2 (M = Ni, 34%; Co, 29%; Fe, 27%). Crystal structure determinations of Co(tBuNNCHCtBuO)2, M(tBuNNCHCiPrO)2 (M = Ni, Co), and M(tBuNNCMeCMeO)2 (M = Ni, Co, Fe) revealed monomeric complexes with tetrahedral geometries about the metal centers. To evaluate the potential of these new complexes as film growth precursors, preparative sublimations, thermogravimetric analyses, solid state decomposition studies, and solution reactions with reducing coreagents were carried out.

Synthesis, structure, and properties of group 1 metal complexes containing nitrogen-rich hydrotris(tetrazolyl)borate ligands.

Nitrogen-rich hydrotris(tetrazolyl)borate salts of lithium, sodium, and potassium have been prepared for the first time by thermolysis of the borohydride ion with three equivalents of tetrazoles in ether solvents at 160-162 °C. Despite the high nitrogen contents, these complexes have low sensitivity to impact, electrostatic discharge, and friction.

Volatility and high thermal stability in mid-to-late first-row transition-metal complexes containing 1,2,5-triazapentadienyl ligands.

Treatment of first-row transition-metal MCl(2) (M = Ni, Co, Fe, Mn, Cr) with 2 equiv of the potassium 1,2,5-triazapentadienyl salts K(tBuNNCHCHNR) (R = tBu, NMe(2)) afforded M(tBuNNCHCHNR)(2) in 18-73% isolated yields after sublimation. The X-ray crystal structures of these compounds show monomeric, tetrahedral molecular geometries, and magnetic moment measurements are consistent with high-spin electronic configurations. Complexes with R = tBu sublime between 155 and 175 °C at 0.

Can Metallapyrimidines Be Aromatic? A Computational Study into a New Class of Metallacycles.

The aromaticity of a series of metallapyrimidines involving second row transition metals was examined using density functional theory. Nucleus independent chemical shifts (NICS) placed above the ring (NICS(1)zz) were used to gauge the amount of aromaticity. Natural chemical shielding analysis (NCS) was employed to decompose the chemical shifts in terms of diamagnetic and paramagnetic contributions from individual molecular orbitals.

Poly(pyrazolyl)aluminate complexes containing aluminum-hydrogen bonds.

The treatment of LiAlH(4) with 2, 3, or 4 equiv of the 3,5-disubstituted pyrazoles Ph(2)pzH or iPr(2)pzH afforded [Li(THF)(2)][AlH(2)(Ph(2)pz)(2)] (97%), [Li(THF)][AlH(Ph(2)pz)(3)] (96%), [Li(THF)(4)][Al(Ph(2)pz)(4)] (95%), and [Li(THF)][AlH(iPr(2)pz)(3)] (89%). The treatment of ZnCl(2) with [Li(THF)][AlH(Ph(2)pz)(3)] afforded Zn(AlH(Ph(2)Pz)(3))H (70%). X-ray crystal structures of these complexes demonstrated κ(2) or κ(3) coordination of the aluminum-based ligands to the Li or Zn ions.

Efficient hydride and pyrazolyl redistribution upon thermolysis of a calcium complex containing dihydrobis(pyrazolyl)borate ligands.

Thermolysis of CaBp(2)(THF)(2) (THF = tetrahydrofuran) at 190-200 °C and 0.05 Torr leads to a redistribution reaction to afford CaTp(2) (90%) and CaTp(BH(4)) (84%). Treatment of CaTp(BH(4)) with THF affords CaTp(BH(4))(THF)(2) and [CaTp(BH(4))(THF)](4), both of which were structurally characterized.

Complexes of the [K(18-Crown-6)]+ fragment with bis(tetrazolyl)borate ligands: unexpected boron-nitrogen bond isomerism and associated enforcement of kappa3-N,N',H-ligand chelation.

The syntheses and solid-state structures of K(BH(2)(RCN(4))(2))(18-crown-6) (R = H, Me, NMe(2), and NiPr(2)) are described. Complexes where R = H and Me have B-N bonds to N(1) of the tetrazolyl groups and form one-dimensional polymers, whereas those with R = NMe(2) and NiPr(2) possess isomeric B-N bonds to N(2) of the tetrazolyl moieties and adopt chelating kappa(3)-N,N',H-coordination modes to the potassium ion.

Optical properties of Al2O3 thin films grown by atomic layer deposition.

We employed the atomic layer deposition technique to grow Al(2)O(3) films with nominal thicknesses of 400, 300, and 200 nm on silicon and soda lime glass substrates. The optical properties of the films were investigated by measuring reflection spectra in the 400-1800 nm wavelength range, followed by numerical fitting assuming the Sellmeier formula for the refractive index of Al(2)O(3). The films grown on glass substrates possess higher refractive indices as compared to the films on silicon.

Volatility and high thermal stability in tantalum complexes containing imido, amidinate, and halide or dialkylamide ligands.

Treatment of Ta(NtBu)Cl(3)(py)(2) with 2 equiv of Li(iPrNCMeNiPr) or Li(tBuNCMeNtBu) afforded Ta(NtBu)(iPrNCMeNiPr)(2)Cl and Ta(NtBu)(tBuNCMeNtBu)(2)Cl in 63% and 61% yields, respectively. Treatment of Ta(NtBu)(iPrNCMeNiPr)(2)Cl or Ta(NtBu)(tBuNCMeNtBu)(2)Cl with LiNRR' afforded Ta(NtBu)(iPrNCMeNiPr)(2)(NRR') and Ta(NtBu)(tBuNCMeNtBu)(2)(NRR') in 79-92% yields (R, R' = Me, Et). Treatment of Ta(NtBu)(tBuNCMeNtBu)(2)Cl with AgBF(4) afforded Ta(NtBu)(tBuNCMeNtBu)(2)F in 54% yield, while treatment of Ta(NtBu)(tBuNCMeNtBu)(2)Cl with BBr(3) afforded Ta(NtBu)(tBuNCMe-NtBu)(2)Br in 68% yield.

Volatility, high thermal stability, and low melting points in heavier alkaline earth metal complexes containing tris(pyrazolyl)borate ligands.

Treatment of MI(2) (M = Ca, Sr) or BaI(2)(THF)(3) with 2 equiv of potassium tris(3,5-diethylpyrazolyl)borate (KTp(Et2)) or potassium tris(3,5-di-n-propylpyrazolyl)borate (KTp(nPr2)) in hexane at ambient temperature afforded CaTp(Et2)(2) (64%), SrTp(Et2)(2) (64%), BaTp(Et2)(2) (67%), CaTp(nPr2)(2) (51%), SrTp(nPr2)(2) (75%), and BaTp(nPr2)(2) (39%). Crystal structure determinations of CaTp(Et2)(2), SrTp(Et2)(2), and BaTp(Et2)(2) revealed monomeric structures. X-ray structural determinations for strontium tris(pyrazolyl)borate (SrTp(2)) and barium tris(pyrazolyl)borate ([BaTp(2)](2)) show that SrTp(2) exists as a monomer and [BaTp(2)](2) exists as a dimer containing two bridging Tp ligands.

Experimental and theoretical study of the coordination of 1,2,4-triazolato, tetrazolato, and pentazolato ligands to the [K(18-crown-6)]+ fragment.

Treatment of 3,5-diisopropyltriazole, 3,5-diphenyltriazole, 3,5-di-3-pyridyltriazole, phenyltetrazole, pyrrolidinyltetrazole, or tert-butyltetrazole with equimolar quantities of potassium hydride and 18-crown-6 in tetrahydrofuran at ambient temperature led to slow hydrogen evolution and formation of (3,5-diisopropyl-1,2,4-triazolato)(18-crown-6)potassium (88%), (3,5-diphenyl-1,2,4-triazolato)(tetrahydrofuran)(18-crown-6)potassium (87%), (3,5-di-3-pyridyl-1,2,4-triazolato)(18-crown-6)potassium (81%), (phenyltetrazolato)(18-crown-6)potassium (94%), (pyrrolidinyltetrazolato)(18-crown-6)potassium (90%), and (tert-butyltetrazolato)(18-crown-6)potassium (94%) as colorless crystalline solids. (1,2,4-Triazolato)(18-crown-6)potassium was isolated as a hemi-hydrate in 81% yield upon treatment of 1,2,4-triazole with potassium metal in tetrahydrofuran. The X-ray crystal structures of these new complexes were determined, and the solid-state structures consist of the nitrogen heterocycles bonded to the (18-crown-6)potassium cationic fragments with eta2-bonding interactions.

Synthesis, structural characterization, and properties of chromium(III) complexes containing amidinato ligands and eta2-pyrazolato, eta(2)-1,2,4-triazolato, or eta1-tetrazolato ligands.

Treatment of anhydrous chromium(III) chloride with 2 or 3 equivalents of 1,3-di-tert-butylacetamidinatolithium or 1,3-diisopropylacetamidinatolithium in tetrahydrofuran at ambient temperature afforded Cr(tBuNC(CH3)NtBu)2(Cl)(THF) and Cr(iPrNC(CH3)NiPr)3 in 78% and 65% yields, respectively. Treatment of Cr(tBuNC(CH3)NtBu)2(Cl)(THF) with the potassium salts derived from pyrazoles and 1,2,4-triazoles afforded Cr(tBuNC(CH3)NtBu)2(X), where X=3,5-disubstituted pyrazolato or 3,5-disubstituted 1,2,4-triazolato ligands, in 65-70% yields. X-Ray crystal structure analyses of Cr(tBuNC(CH3)NtBu)2(Me2pz) (Me2pz=3,5-dimethylpyrazolato) and Cr(tBuNC(CH3)NtBu)2(Me2trz) (Me2trz=3,5-dimethyl-1,2,4-triazolato) revealed eta2-coordination of the Me2pz and Me2trz ligands.

Atomic layer deposition of tungsten(III) oxide thin films from W2(NMe2)6 and water: precursor-based control of oxidation state in the thin film material.

The atomic layer deposition of W2O3 films was demonstrated employing W2(NMe2)6 and water as precursors with substrate temperatures between 140 and 240 degrees C. At 180 degrees C, surface saturative growth was achieved with W2(NMe2)6 vapor pulse lengths of >/=2 s. The growth rate was about 1.

Synthesis, structure, and properties of a dimeric chromium(II) pyrazolato complex with a long chromium-chromium distance. Maintenance of a dimeric structure in solution and interconversion between dimeric and monomeric structures.

The synthesis, solid-state structure, and solution structure of Cr2(tBu2pz)4 are described. This complex is obtained by sublimation of the monomeric species Cr(tBu2pz)2(4-tBupy)2 and contains long chromium-chromium distances that are enforced by the divergent nature of the pyrazolato ligands.

Film growth precursor development for metal nitrides. Synthesis, structure, and volatility of molybdenum(VI) and tungsten(VI) complexes containing bis(imido)metal fragments and various nitrogen donor ligands.

The molybdenum and tungsten complexes W2(NtBu)4(pz)4(pzH).(C6H14)0.5 (pz = pyrazolate), M(NtBu)2(Me2pz)2(Me2pzH)2 (Me2pz = 3,5-dimethylpyrazolate), M(NtBu)2(tBu2pz)2 (tBu2pz = 3,5-di-tert-butylpyrazolate), M2(NtBu)4(Me2pz)2Cl2, W(NtBu)2(C2N3(iPr)2)2py2, M(NtBu)2-(CN4CF3)2py2, and W(NtBu)2(PhNNNPh)2 were prepared by various synthetic routes from the starting materials Mo(NtBu)2Cl2, W(NtBu)2(NHtBu)2, and W(NtBu)2Cl2py2.