Anisotropy of impact ionization in WSe field effect transistors.

Carrier multiplication via impact ionization in two-dimensional (2D) layered materials is a very promising process for manufacturing high-performance devices because the multiplication has been reported to overcome thermodynamic conversion limits. Given that 2D layered materials exhibit highly anisotropic transport properties, understanding the directionally-dependent multiplication process is necessary for device applications. In this study, the anisotropy of carrier multiplication in the 2D layered material, WSe, is investigated.

A steep-switching impact ionization-based threshold switching field-effect transistor.

A steep switching device with a low subthreshold swing (SS) that overcomes the fundamental Boltzmann limit (/) is required to efficiently process a continuously increasing amount of data. Recently, two-dimensional material-based impact ionization transistors with various structures have been reported with the advantages of a low critical electric field and a unique quantum confinement effect. However, most of them cannot retain steep switching at room temperature, and device performance degradation issues caused by impact ionization-induced hot carriers have not been structurally addressed.

A steep switching WSe impact ionization field-effect transistor.

The Fermi-Dirac distribution of carriers and the drift-diffusion mode of transport represent two fundamental barriers towards the reduction of the subthreshold slope (SS) and the optimization of the energy consumption of field-effect transistors. In this study, we report the realization of steep-slope impact ionization field-effect transistors (IFETs) based on a gate-controlled homogeneous WSe lateral junction. The devices showed average SS down to 2.