ToF-SIMS Li Depth Profiling of Pure and Methylated Amorphous Silicon Electrodes After Their Partial Lithiation.

Pure (a-Si:H) and methylated [a-Si(CH):H] amorphous silicon thin films were analyzed by time-of-flight secondary ion mass spectrometry after partial lithiation. Depth profiling gives insights into the lithiation mechanism of the material, enabling us to study the detailed biphasic process in the first lithiation process. Lithiation induces swelling and roughening of the active layer.

Growth of Fe-BDC Metal-Organic Frameworks onto Functionalized Si (111) Surfaces.

The realization of metal-organic framework (MOF) layers onto solid surfaces is a prerequisite for their integration into devices. This work reports the direct growth of Fe /benzene di-carboxylate MOFs onto functionalized silicon surfaces, compatible with a wide range of MOF synthesis conditions. The co-nucleation and growth of different crystalline phases are evidenced, whose coverage depends on the surface chemistry and/or the solution composition.

Novel and Innovative Interface as Potential Active Layer in Chem-FET Sensor Devices for the Specific Sensing of Cs.

An innovative novel interface has been designed and developed to be used as a potential active layer in chemically sensitive field-effect transistor (Chem-FET) sensor devices for the specific sensing of Cs. In this study, the synthesis of a specific Cs probe based on calix[4]arene benzocrown ether, its photophysical properties, and its grafting onto a single lipid monolayer (SLM) recently used as an efficient ultrathin organic dielectric in Chem-FETs are reported simultaneously. On the basis of both optical and NMR titration experiments, the probe has shown high selectivity and specificity for Cs compared to interfering cations, even if an admixture is used.

Structure of Mixed Acid/Decyl Monolayers Grafted on Oxide-Free Si(111) Surfaces.

The structure of mixed acid/decyl monolayers (MLs) grafted on oxide-free Si(111) surfaces by photochemical hydrosilylation in a mixture of neat undecylenic acid and 1-decene is studied in detail. After appropriate surface cleaning of the as-grafted surfaces, atomic force microscopy (AFM) (topography and phase imaging) and calibrated FTIR analysis demonstrate that a mixed monolayer is formed, free of residue. When the acid-molecule fraction (Γ) is >0.

Quantitative IR readout of fulgimide monolayer switching on Si(111) surfaces.

Creating photoactive monolayers of photochromes is of considerable technological interest. This paper describes the construct of fulgimide monolayers on silicon surfaces and presents a quantitative IR analysis studies of their composition and switching properties. The scheme on top shows the structure of the starting C-form terminated Si(111) surface and the graph below sketches the surface composition at the photostationnary states under visisble and UV irradiation, as derived from in situ IR spectroscopy after several UV/vis irradiation cycles.

Well-defined carboxyl-terminated alkyl monolayers grafted onto H-Si(111): packing density from a combined AFM and quantitative IR study.

This work demonstrates that well-defined mixed carboxyl-terminated/methyl-terminated alkyl monolayers can be prepared in one step on H-terminated Si(111) via direct photochemical hydrosilylation of undecylenic acid and 1-decene mixtures. As evidenced by AFM imaging and IR spectroscopy, a final rinse in hot acetic acid leaves the functionalized surface atomically smooth and perfectly free of physisorbed contaminants while unwanted material remains atop the monolayer with most other common solvents. The compositional surface chemistry was determined from a truly quantitative IR (ATR geometry) study in the range of 900-4000 cm(-)(1).

Truly quantitative XPS characterization of organic monolayers on silicon: study of alkyl and alkoxy monolayers on H-Si(111).

The quantitative characterization of the chemical composition (bonding at grafted and ungrafted sites, surface coverage) is a key issue for the application of silicon-organic monolayer hybrid interfaces. The primary purpose of this article is to demonstrate that X-ray photoelectron spectroscopy (XPS) requires to be truly quantitative to deal with two main questions. The first one is accounting for X-ray photodiffraction (XPD), a well-known phenomenon that is responsible for azimuthal variations of the XPS signal intensity.