Intel's efforts to build a practical quantum computer are focused on developing a scalable spin-qubit platform leveraging industrial high-volume semiconductor manufacturing expertise and 300 mm fabrication infrastructure. Here, we provide an overview of the design, fabrication, and demonstration of a new customized quantum test chip, which contains 12-quantum-dot spin-qubit linear arrays, code named Tunnel Falls. These devices are fabricated using immersion and extreme ultraviolet lithography (EUV), along with other standard high-volume manufacturing (HVM) processes as well as production-level process control.
View Article and Find Full Text PDFThe experimental demonstration of a p-type 2D WSe transistor with a ferroelectric perovskite BaTiO gate oxide is presented. The 30 nm thick BaTiO gate stack shows a robust ferroelectric hysteresis with a remanent polarization of 20 μC/cm and further enables a capacitance equivalent thickness of 0.5 nm in the hybrid WSe/BaTiO stack due to its high dielectric constant of 323.
View Article and Find Full Text PDFThe academic and industrial communities have proposed two-dimensional (2D) transition metal dichalcogenide (TMD) semiconductors as a future option to supplant silicon transistors at sub-10nm physical gate lengths. In this Comment, we share the recent progress in the fabrication of complementary metal-oxide-semiconductor (CMOS) devices based on stacked 2D TMD nanoribbons and specifically highlight issues that still need to be resolved by the 2D community in five crucial research areas: contacts, channel growth, gate oxide, variability, and doping. While 2D TMD transistors have great potential, more research is needed to understand the physical interactions of 2D materials at the atomic scale.
View Article and Find Full Text PDF