Reversible Photo-Induced Reshaping of Imprinted Microstructures Using a Low Molecular Azo Dye.

A blend of low molecular azo glass (AZOPD) and polystyrene (PS) were used for the systematic investigation of photo-induced stretching and recovery of nanoimprinted structures. For this purpose, light and heat was used as recovery stimuli. The AZOPD/PS microstructures, fabricated with thermal nanoimprint lithography (tNIL), comprises three different shapes (circles, crosses and squares) and various concentrations of AZOPD fractions.

3D Micro/Nanopatterning of a Vinylferrocene Copolymer.

In nanoimprint lithography (NIL), a pattern is created by mechanical deformation of an imprint resist via embossing with a stamp, where the adhesion behavior during the filling of the imprint stamp and its subsequent detachment may impose some practical challenges. Here we explored thermal and reverse NIL patterning of polyvinylferrocene and vinylferrocene-methyl methacrylate copolymers to prepare complex non-spherical objects and patterns. While neat polyvinylferrocene was found to be unsuitable for NIL, freshly-prepared vinylferrocene-methyl methacrylate copolymers, for which identity and purity were established, have been structured into 3D-micro/nano-patterns using NIL.