Numerical Investigation for Scale-Up of an Electron Cyclotron Resonance Plasma for Fluorine-Doped Tin Oxide Thin Film Production.

A low-temperature process is required to deposit fluorine doped tin oxide (FTO) as a transparent conductive oxide on polyethylene terephthalate (PET) substrate, as the latter is polymeric and has a low melting point. An electron cyclotron resonance (ECR) plasma system is the best way to deposit metal oxide with high transparency and electrical conductivity at temperatures below 100 °C. Characteristics of an ECR plasma include its high ionization energy and electron density; however, its use is limited in large-scale deposition.

Preparation of Gold Nanoparticles Deposited Silicon Thin Film Electrode by Self-Assembly Method for the Employment of an Anode Material for Lithium Secondary Batteries.

This work describes a self-assembly method of gold nanoparticles coating on the surface of silicon thin films for the anode material of lithium secondary batteries. The preparation of the silicon thin films was carried out by electron cyclotron resonance metal organic chemical vapor deposition (ECR-MOCVD) process. The obtained films were further coated with (3-aminopropyl)-trimethoxysilane (APTMS) which has a role to bind the oxygen functional groups on Si surface and the gold nanoparticles.

High thermal performance of SnO2:F thin transparent heaters with scattered metal nanodots.

Facile production and novel transparent heaters consisting of fluorine-doped tin oxide (SnO2:F or FTO) thin films covered with three different scattered metal nanodots (Cr-nd, NiCr-nd and Ni-nd) prepared by plasma-enhanced sputtering system and electron cyclotron resonance-metal organic chemical vapor deposition are investigated. The heaters exhibit excellent optical transmittances of over 85% and superior saturated temperatures of more than 80 °C when a relatively low 12 V DC is supplied. The scattered metal nanodots FTO heaters successfully improve the specific power of bare FTO heater by 21, 15, and 12% for NiCr-nd FTO, Cr-nd FTO, and Ni-nd FTO, respectively.