Structural comparison of GdF3 films grown on CaF2 (111) and SiO2 substrates.

Wide bandgap metal fluorides are the materials of choice for optical coating applications at 193 nm. Low loss and environmentally stable optics requires a mitigating fluoride film structure on a nanometer scale. To understand the growth mechanism of fluoride materials, GdF(3) films grown on CaF(2) (111) and SiO(2) substrates were investigated.