Parallelized laser-direct patterning of nanocrystalline metal thin films by use of a pulsed laser-induced thermo-elastic force.

Thin film patterning by the conventional lithographic technique requires a number of steps including the deposition, development, and removal of the photoresist layer. Here we demonstrate that metal thin films evaporated on glass can be directly patterned by a spatially modulated pulsed Nd-YAG laser beam (wavelength = 1064 nm, pulse width = 6 ns) incident from the backside of the substrate. This method utilizes a pulsed laser-induced thermo-elastic force exerted on the film which plays a role in detaching it from the substrate.