Lattice Vacancy Induced Energy Renormalization of Photonic Quasiparticles in Two-Dimensional Semiconductors.

Coulomb interactions among dense charges and quasiparticle energy renormalization are at the center of quantum science because they significantly reshape the fundamental electronic and photonic properties of materials. While lattice vacancies are ubiquitous in solid materials, their physical effect on the Coulomb interaction among quasiparticles is normally weak and negligible. Here we show that in atomically thin semiconductors the presence of lattice vacancies emerges as an important but unexplored origin for the nontrivial renormalization of quasiparticle binding energies, due to the subtle modification of overall dielectric functions at low dimensionality.

Performance limit of all-wrapped monolayer MoS transistors.

All-wrapped transistors consisting of two-dimensional transition-metal dichalcogenide channels are appealing candidates for post-silicon electronics. Based on the Boltzmann transport theory, here we report a comprehensive theoretical survey on the performance limits for monolayer MoS transistors with three prototypical gate dielectrics (AlO, HfO and BN), by including primary extrinsic charge scattering mechanisms present in practical devices. A concept of "dead space" between the dielectrics and channels is proposed and used in calculation to ameliorate the general overestimation in scattering intensity of surface optical phonons, which enables an accurate description of electronic transport behavior.

Coulomb Screening and Scattering in Atomically Thin Transistors across Dimensional Crossover.

Layered two-dimensional dichalcogenides are potential candidates for post-silicon electronics. Here, we report insightfully experimental and theoretical studies on the fundamental Coulomb screening and scattering effects in these correlated systems, in response to the changes of three crucial Coulomb factors, including electric permittivity, interaction distance, and density of Coulomb impurities. We systematically collect and analyze the trends of electron mobility with respect to the above factors, realized by synergic modulations on channel thicknesses and gating modes in dual-gated MoS transistors with asymmetric dielectric cleanliness.

Clean BN-Encapsulated 2D FETs with Lithography-Compatible Contacts.

Device passivation through ultraclean hexagonal BN encapsulation has proven to be one of the most effective ways of constructing high-quality devices with atomically thin semiconductors that preserve the ultraclean interface quality and intrinsic charge transport behavior. However, it remains challenging to integrate lithography-compatible contact electrodes with flexible distributions and patterns. Here, we report the feasibility of a straightforward integration of lithography-defined contacts into BN-encapsulated two-dimensional field-effect transistors (2D FETs), giving rise to overall device quality comparable to the state-of-the-art results from the painstaking pure dry transfer processing.