Publications by authors named "Bhim Chamlagain"

The MoS thin film has attracted a lot of attention due to its potential applications in flexible electronics, sensors, catalysis, and heterostructures. Understanding the effect of long-term ambient exposure on the electrical properties of the thin film is important for achieving many overreaching goals of this material. Here, we report for the first time a systematic study of electrical property variation and stability of MoS thin films under ambient exposure of up to a year.

View Article and Find Full Text PDF

Nanostructure morphologies of transition metal dichalcogenides (TMDs) are gaining much interest owing to their catalytic, sensing, and energy storage capabilities. Here, we report the synthesis of highly dense MoO/MoS core-shell nanoparticles, a new form of TMD nanostructure, via chemical vapor deposition using new growth geometry where a thin film of MoO was used as a source substrate for Mo as opposed to using MoO powder used in conventional studies. To grow the MoO/MoS core-shell nanoparticles, we precisely control the carrier gas flow rate and sulfur vapor introduction time with respect to the melting of a MoO thin film used for Mo precursor.

View Article and Find Full Text PDF

Scalable heterojunctions based on two-dimensional transitional metal dichalcogenides are of great importance for their applications in the next generation of electronic and optoelectronic devices. However, reliable techniques for the fabrication of such heterojunctions are still at its infancy. Here we demonstrate a simple technique for the scalable fabrication of lateral heterojunctions via selective chemical doping of TMD thin films.

View Article and Find Full Text PDF

We present a new and viable template-assisted thermal synthesis method for preparing amorphous ultrathin transition-metal oxides (TMOs) such as TiO and TaO, which are converted from crystalline two-dimensional (2D) transition-metal dichalcogenides (TMDs) down to a few atomic layers. X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning transmission electron microscopy (STEM) were used to characterize the chemical composition and bonding, surface morphology, and atomic structure of these ultrathin amorphous materials to validate the effectiveness of our synthesis approach. Furthermore, we have fabricated metal-insulator-metal (MIM) diodes using the TiO and TaO as ultrathin insulating layers with low potential barrier heights.

View Article and Find Full Text PDF

A black phosphorus photodetector is utilized to investigate the light-scattering patterns of a silicon waveguide through wavelength- and polarization-dependent scanning photocurrent measurements. The photocurrent signals exhibit similar patterns to the light-intensity distribution of the waveguide calculated by finite-difference time-domain simulations, suggesting that photoexcited electron-hole pairs in the silicon waveguide can be injected into phosphorene to induce its photoresponse.

View Article and Find Full Text PDF

We report a new strategy for fabricating 2D/2D low-resistance ohmic contacts for a variety of transition metal dichalcogenides (TMDs) using van der Waals assembly of substitutionally doped TMDs as drain/source contacts and TMDs with no intentional doping as channel materials. We demonstrate that few-layer WSe2 field-effect transistors (FETs) with 2D/2D contacts exhibit low contact resistances of ∼0.3 kΩ μm, high on/off ratios up to >10(9), and high drive currents exceeding 320 μA μm(-1).

View Article and Find Full Text PDF

We investigate the photocurrent generation mechanisms at a vertical p-n heterojunction between black phosphorus (BP) and molybdenum disulfide (MoS2) flakes through polarization-, wavelength-, and gate-dependent scanning photocurrent measurements. When incident photon energy is above the direct band gap of MoS2, the photocurrent response demonstrates a competitive effect between MoS2 and BP in the junction region. In contrast, if the incident photon energy is below the band gap of MoS2 but above the band gap of BP, the photocurrent response at the p-n junction exhibits the same polarization dependence as that at the BP-metal junction, which is nearly parallel to the MoS2 channel.

View Article and Find Full Text PDF

We investigate the wavelength- and polarization-dependence of photocurrent signals generated at few-layer MoS2-metal junctions through spatially resolved photocurrent measurements. When incident photon energy is above the direct bandgap of few-layer MoS2, the maximum photocurrent response occurs for the light polarization direction parallel to the metal electrode edge, which can be attributed to photovoltaic effects. In contrast, if incident photon energy is below the direct bandgap of MoS2, the photocurrent response is maximized when the incident light is polarized in the direction perpendicular to the electrode edge, indicating different photocurrent generation mechanisms.

View Article and Find Full Text PDF

We investigate electrical transport and optoelectronic properties of field effect transistors (FETs) made from few-layer black phosphorus (BP) crystals down to a few nanometers. In particular, we explore the anisotropic nature and photocurrent generation mechanisms in BP FETs through spatial-, polarization-, gate-, and bias-dependent photocurrent measurements. Our results reveal that the photocurrent signals at BP-electrode junctions are mainly attributed to the photovoltaic effect in the off-state and photothermoelectric effect in the on-state, and their anisotropic feature primarily results from the directional-dependent absorption of BP crystals.

View Article and Find Full Text PDF

We report the fabrication of both n-type and p-type WSe2 field-effect transistors with hexagonal boron nitride passivated channels and ionic-liquid (IL)-gated graphene contacts. Our transport measurements reveal intrinsic channel properties including a metal-insulator transition at a characteristic conductivity close to the quantum conductance e(2)/h, a high ON/OFF ratio of >10(7) at 170 K, and large electron and hole mobility of μ ≈ 200 cm(2) V(-1 )s(-1) at 160 K. Decreasing the temperature to 77 K increases mobility of electrons to ∼330 cm(2) V(-1) s(-1) and that of holes to ∼270 cm(2) V(-1) s(-1).

View Article and Find Full Text PDF

We report low-temperature scanning tunneling microscopy characterization of MoSe2 crystals and the fabrication and electrical characterization of MoSe2 field-effect transistors on both SiO2 and parylene-C substrates. We find that the multilayer MoSe2 devices on parylene-C show a room-temperature mobility close to the mobility of bulk MoSe2 (100-160 cm(2) V(-1) s(-1)), which is significantly higher than that on SiO2 substrates (≈50 cm(2) V(-1) s(-1)). The room-temperature mobility on both types of substrates are nearly thickness-independent.

View Article and Find Full Text PDF

We report the fabrication of ionic liquid (IL)-gated field-effect transistors (FETs) consisting of bilayer and few-layer MoS2. Our transport measurements indicate that the electron mobility μ ≈ 60 cm(2) V(-1) s(-1) at 250 K in IL-gated devices exceeds significantly that of comparable back-gated devices. IL-FETs display a mobility increase from ≈ 100 cm(2) V(-1) s(-1) at 180 K to ≈ 220 cm(2) V(-1) s(-1) at 77 K in good agreement with the true channel mobility determined from four-terminal measurements, ambipolar behavior with a high ON/OFF ratio >10(7) (10(4)) for electrons (holes), and a near ideal subthreshold swing of ≈ 50 mV/dec at 250 K.

View Article and Find Full Text PDF