Al/Si Nanopillars as Very Sensitive SERS Substrates.

In this paper, we present a fast fabrication of Al/Si nanopillars for an ultrasensitive SERS detection of chemical molecules. The fabrication process is only composed of two steps: use of a native oxide layer as a physical etch mask followed by evaporation of an aluminum layer. A random arrangement of well-defined Al/Si nanopillars is obtained on a large-area wafer of Si.