Optical Emission Imaging and Modeling Investigations of Microwave-Activated SiH/H and SiH/CH/H Plasmas.

Silicon is a known trace contaminant in diamond grown by chemical vapor deposition (CVD) methods. Deliberately Si-doped diamond is currently attracting great interest because of the attractive optical properties of the negatively charged silicon-vacancy (SiV) defect. This work reports in-depth studies of microwave-activated H plasmas containing trace (10-100 ppm) amounts of SiH, with and without a few % of CH, operating at pressures and powers relevant for contemporary diamond CVD, using a combination of experiment (spatially resolved optical emission (OE) imaging) and two-dimensional plasma chemical modeling.

Imaging and Modeling the Optical Emission from CH Radicals in Microwave Activated C/H Plasmas.

We report a combined experimental/modeling study of optical emission from the AΔ, BΣ, and CΣ states of the CH radical in microwave (MW) activated CH/H gas mixtures operating under a range of conditions relevant to the chemical vapor deposition of diamond. The experiment involves spatially and wavelength resolved imaging of the CH(C → X), CH(B → X), and CH(A → X) emissions at different total pressures, MW powers, C/H ratios in the source gas, and substrate diameters. The results are interpreted by extending an existing 2D (, ) plasma model to include not just electron impact excitation but also chemiluminescent (CL) bimolecular reactions as sources of the observed CH emissions.

Spatially Resolved Optical Emission and Modeling Studies of Microwave-Activated Hydrogen Plasmas Operating under Conditions Relevant for Diamond Chemical Vapor Deposition.

A microwave (MW) activated hydrogen plasma operating under conditions relevant to contemporary diamond chemical vapor deposition reactors has been investigated using a combination of experiment and self-consistent 2-D modeling. The experimental study returns spatially and wavelength resolved optical emission spectra of the d → a (Fulcher), G → B, and e → a emissions of molecular hydrogen and of the Balmer-α emission of atomic hydrogen as functions of pressure, applied MW power, and substrate diameter. The modeling contains specific blocks devoted to calculating (i) the MW electromagnetic fields (using Maxwell's equations) self-consistently with (ii) the plasma chemistry and electron kinetics, (iii) heat and species transfer, and (iv) gas-surface interactions.

What [plasma used for growing] diamond can shine like flame?

Diamond synthesis by chemical vapour deposition (CVD) from carbon-containing gas mixtures has by now long been an industrial reality, but commercial interest and investment into the technology has grown dramatically in the last several years. This Feature Article surveys recent advances in our understanding of the gas-phase chemistry of microwave-activated methane/hydrogen plasmas used for diamond CVD, including that of added boron-, nitrogen- and oxygen-containing dopant species. We conclude by considering some of the remaining challenges in this important area of contemporary materials science.

Microwave Plasma-Activated Chemical Vapor Deposition of Nitrogen-Doped Diamond. II: CH/N/H Plasmas.

We report a combined experimental and modeling study of microwave-activated dilute CH/N/H plasmas, as used for chemical vapor deposition (CVD) of diamond, under very similar conditions to previous studies of CH/H, CH/H/Ar, and N/H gas mixtures. Using cavity ring-down spectroscopy, absolute column densities of CH(X, v = 0), CN(X, v = 0), and NH(X, v = 0) radicals in the hot plasma have been determined as functions of height, z, source gas mixing ratio, total gas pressure, p, and input power, P. Optical emission spectroscopy has been used to investigate, with respect to the same variables, the relative number densities of electronically excited species, namely, H atoms, CH, C, CN, and NH radicals and triplet N molecules.

Determination of Stark parameters by cross-calibration in a multi-element laser-induced plasma.

We illustrate a Stark broadening analysis of the electron density Ne and temperature Te in a laser-induced plasma (LIP), using a model free of assumptions regarding local thermodynamic equilibrium (LTE). The method relies on Stark parameters determined also without assuming LTE, which are often unknown and unavailable in the literature. Here, we demonstrate that the necessary values can be obtained in situ by cross-calibration between the spectral lines of different charge states, and even different elements, given determinations of Ne and Te based on appropriate parameters for at least one observed transition.

Microwave Plasma-Activated Chemical Vapor Deposition of Nitrogen-Doped Diamond. I. N2/H2 and NH3/H2 Plasmas.

We report a combined experimental/modeling study of microwave activated dilute N2/H2 and NH3/H2 plasmas as a precursor to diagnosis of the CH4/N2/H2 plasmas used for the chemical vapor deposition (CVD) of N-doped diamond. Absolute column densities of H(n = 2) atoms and NH(X(3)Σ(-), v = 0) radicals have been determined by cavity ring down spectroscopy, as a function of height (z) above a molybdenum substrate and of the plasma process conditions, i.e.

A reanalysis of the A 1A"-X 1A' transition of CFBr.

The laser induced fluorescence spectrum of the A (1)A(")-X (1)A(') transition of CFBr is presented, with selected bands recorded at sub-Doppler resolution, allowing the rotational constants to be fully determined. Analysis of dispersed fluorescence spectra and the pattern of (79)Br/(81)Br isotope splittings indicate that the origin must be shifted from previous assignments in the literature to 23 271.0 cm(-1).