Metal-Organic Framework Thin Films as Platforms for Atomic Layer Deposition of Cobalt Ions To Enable Electrocatalytic Water Oxidation.

Thin films of the metal-organic framework (MOF) NU-1000 were grown on conducting glass substrates. The films uniformly cover the conducting glass substrates and are composed of free-standing sub-micrometer rods. Subsequently, atomic layer deposition (ALD) was utilized to deposit Co(2+) ions throughout the entire MOF film via self-limiting surface-mediated reaction chemistry.

Synthesis of nanocrystals of Zr-based metal-organic frameworks with csq-net: significant enhancement in the degradation of a nerve agent simulant.

The synthesis of nano-sized particles of NU-1000 (length from 75 nm to 1200 nm) and PCN-222/MOF-545 (length from 350 nm to 900 nm) is reported. The catalytic hydrolysis of methyl paraoxon was investigated as a function of NU-1000 crystallite size and a significant enhancement in the rate was observed for the nano-sized crystals compared to microcrystals.

Competitive photoelectrochemical methanol and water oxidation with hematite electrodes.

Photocatalytic water and methanol oxidation were studied at thin film hematite electrodes synthesized by atomic layer deposition (ALD). Systematic photoelectrochemical characterization along with O2 evolution measurements were carried out in order to better understand the mechanisms of both water and methanol oxidation at hematite electrodes. When both water and methanol are present in the solution, they are oxidized competitively with each other, allowing the detection and assignment of distinct surface states characteristic to each process.

Directed growth of electroactive metal-organic framework thin films using electrophoretic deposition.

Electrophoretic deposition (EPD) is used to assemble metal-organic framework (MOF) materials in nano- and micro-particulate, thin-film form. The flexibility of the method is demonstrated by the successful deposition of 4 types of MOFs: NU-1000, UiO-66, HKUST-1, and Al-MIL-53. Additionally, EPD is used to pattern the growth of NU-1000 thin films that exhibit full electrochemical activity.

Atomic layer deposition of a submonolayer catalyst for the enhanced photoelectrochemical performance of water oxidation with hematite.

Hematite photoanodes were coated with an ultrathin cobalt oxide layer by atomic layer deposition (ALD). The optimal coating-1 ALD cycle, which amounts to <1 monolayer of Co(OH)2/Co3O4-resulted in significantly enhanced photoelectrochemical water oxidation performance. A stable, 100-200 mV cathodic shift in the photocurrent onset potential was observed that is correlated to an order of magnitude reduction in the resistance to charge transfer at the Fe2O3/H2O interface.

Photoelectrochemical and impedance spectroscopic investigation of water oxidation with "Co-Pi"-coated hematite electrodes.

Uniform thin films of hematite (α-Fe(2)O(3)) deposited by atomic layer deposition (ALD) coated with varying amounts of the cobalt phosphate catalyst, "Co-Pi," were investigated with steady-state and transient photoelectrochemical measurements and impedance spectroscopy. Systematic studies as a function of Co-Pi thickness were performed in order to clarify the mechanism by which Co-Pi enhances the water-splitting performance of hematite electrodes. It was found that under illumination, the Co-Pi catalyst can efficiently collect and store photogenerated holes from the hematite electrode.

Water oxidation at hematite photoelectrodes: the role of surface states.

Hematite (α-Fe(2)O(3)) constitutes one of the most promising semiconductor materials for the conversion of sunlight into chemical fuels by water splitting. Its inherent drawbacks related to the long penetration depth of light and poor charge carrier conductivity are being progressively overcome by employing nanostructuring strategies and improved catalysts. However, the physical-chemical mechanisms responsible for the photoelectrochemical performance of this material (J(V) response) are still poorly understood.

Photoelectrochemical investigation of ultrathin film iron oxide solar cells prepared by atomic layer deposition.

Atomic layer deposition was used to grow conformal thin films of hematite with controlled thickness on transparent conductive oxide substrates. The hematite films were incorporated as photoelectrodes in regenerative photoelectrochemical cells employing an aqueous [Fe(CN)(6)](3-/4-) electrolyte. Steady state current density versus applied potential measurements under monochromatic and simulated solar illumination were used to probe the photoelectrochemical properties of the hematite electrodes as a function of film thickness.