X-ray multilayer monochromator with enhanced performance.

An x-ray multilayer monochromator with improved resolution and a low specular background is presented. The monochromator consists of a lamellar multilayer amplitude grating with appropriate parameters used at the zeroth diffraction order. The device is fabricated by means of combining deposition of thin films on a nanometer scale, UV lithography, and reactive ion etching.

X-UV lamellar multilayer amplitude gratings.

The concept of X-UV Lamellar Multilayer Amplitude Grating (LMAG) is introduced and a method of fabrication is given. Dynamical and kinematic theories of the diffraction by a LMAG are presented. Different applications of the LMAGs are considered.

Experimental study and simulation of the damage induced to various multilayer interferential mirrors by soft x-ray plasma-laser sources.

The damage induced to various multilayer interferential mirrors (MIMs) by intense soft X-ray plasma-laser sources are studied both experimentally and theoretically. The mirrors consist of periodic bilayers made up with C/W, Si/Mo, Si/W\. One set of Si/W MIMs is coated with a 100 nm Si film devised to protect the multilayer structure.

Influence of the Number of Bilayers on the Optical Performances of X-UV Multilayer Interferential Mirrors.

The influence of the number of bilayers on the optical performances of actual X-UV multilayer interferential mirrors (MIMs) has been studied in order to emphasize the experimental restrictions in the designing of "thick" mirrors used for the development of etched multilayer gratings. Several sets of samples (W/C, Mo/Si) with increasing number of bilayers have been manufactured in the very same conditions by means of a sputtering technique. X-ray diffraction characterization at Cu-Kα radiation (λ = 1.

Theoretical and experimental investigation of x-ray diffraction by a lamellar multilayer amplitude grating.

We present experimental and theoretical studies of the diffraction by an x-ray lamellar multilayer amplitude grating. The main diffraction properties of such a device are given. Experimental efficiency curves are obtained at 800 eV photon energy using synchrotron radiation.

Tungsten/Magnesium silicide multilayers for soft x-ray optics.

W/Mg2Si multilayers for soft x-ray optics above the MgKα and MgLα lines have been deposited by RF sputtering. Their structural characteristics have been deduced from in situ kinetic ellipsometry, ex situ grazing x-ray reflection measurements, and high-resolution electron microscopy. Their soft x-ray performances have been measured by synchrotron radiation around the MgKα and MgLα lines and related to the structural characteristics.

Absolute reflectivity measurements at 44.79 A of sputter deposited multilayer x-ray mirrors.

Multilayer x-ray mirrors have been deposited using a dc triode sputtering system, which incorporates an accurate method of thickness monitoring based on the dependence of the deposition rate on the target current. Thickness can be controlled with an accuracy of better than 0.1 A.

Extreme UV and x-ray scattering measurements from a rough LiF crystal surface characterized by electron micrography.

XUV and x-ray scattering by a LiF crystal is measured. The angular distribution of the scattered radiation (ADSR) reveals characteristic features, side peaks or asymmetry. The surface of the sample is statistically characterized by a microdensitometer analysis of electron micrographs resolving the short spatial wavelengths of the surface roughness.

Comparative efficiency of natural crystals and multilayers as dispersing devices in the copper L(2,3) range.

Recent sputtering techniques have been used to produce layered synthetic microstructures (LSMs) as dispersing devices for varied applications in x-ray optics and spectroscopy. These analyzers, specially suited for synchrotron radiation, have been mounted in a two-parallel crystal monochromator. In this paper we show the first experimental results obtained with beryl crystals and multilayers for analyzing x-ray spectral distributions transmitted through screens or reflected on mirrors of copper near the L(2) and L(3) absorption edges.