Surface Depth Analysis of Chemical Changes in Random Copolymer Thin Films Composed of Hydrophilic and Hydrophobic Silicon-Based Monomers Induced by Plasma Treatment as Studied by Hard X-ray Photoelectron Spectroscopy and Neutron Reflectivity Measurements.

In this study, a silicon-based copolymer, poly(tris(trimethylsiloxy)-3-methacryloxypropylsilane)--poly(,-dimethyl acrylamide), thin film was subjected to plasma surface treatment to make its surface hydrophilic (biocompatible). Neutron reflectivity (NR) measurement of the plasma-treated thin film showed a decrease in the film thickness (etching width: ∼20 nm) and an increase in the scattering length density (SLD) near the surface (∼15 nm). The region with a considerably high SLD adsorbed water (DO) from its saturated vapor, indicating its superior surface hydrophilicity.