Publications by authors named "Assael Cohen"

Direct-bandgap transition metal dichalcogenide monolayers are appealing candidates to construct atomic-scale spin-optical light sources owing to their valley-contrasting optical selection rules. Here we report on a spin-optical monolayer laser by incorporating a WS monolayer into a heterostructure microcavity supporting high-Q photonic spin-valley resonances. Inspired by the creation of valley pseudo-spins in monolayers, the spin-valley modes are generated from a photonic Rashba-type spin splitting of a bound state in the continuum, which gives rise to opposite spin-polarized ±K valleys due to emergent photonic spin-orbit interaction under inversion symmetry breaking.

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Article Synopsis
  • Conventional epitaxy is essential in semiconductor technology, allowing precise atomic-scale control over thin films and nanostructures for applications in nanoelectronics and sensors.
  • "Van der Waals" (vdW) and "quasi-vdW (Q-vdW)" epitaxy describe the weaker interactions during the growth of 2D materials on various substrates, with intense research focused on layer growth of transition metal dichalcogenides (TMDCs) on sapphire.
  • This study investigates the growth of WS using a metal-seeding step in a metal-organic chemical vapor deposition (MOCVD) system, revealing how an interfacial layer affects the epitaxial growth of semiconductor layers, which may inform the design of
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Metal-organic chemical vapor deposition (MOCVD) is one of the main methodologies used for thin-film fabrication in the semiconductor industry today and is considered one of the most promising routes to achieve large-scale and high-quality 2D transition metal dichalcogenides (TMDCs). However, if special measures are not taken, MOCVD suffers from some serious drawbacks, such as small domain size and carbon contamination, resulting in poor optical and crystal quality, which may inhibit its implementation for the large-scale fabrication of atomic-thin semiconductors. Here we present a growth-etch MOCVD (GE-MOCVD) methodology, in which a small amount of water vapor is introduced during the growth, while the precursors are delivered in pulses.

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