Room-Temperature Patterning of Nanoscale MoS under an Electron Beam.

Molybdenum disulfide (MoS) is traditionally grown at a high temperature and subsequently patterned to study its electronic properties or make devices. This method imposes severe limitations on the shape and size of MoS crystals that can be patterned precisely at required positions. Here, we describe a method of direct nanoscale patterning of MoS at room temperature by exposing a molybdenum thiocubane single-source precursor to a beam of electrons.

Direct Patterning of Zinc Sulfide on a Sub-10 Nanometer Scale via Electron Beam Lithography.

Nanostructures of metal sulfides are conventionally prepared via chemical techniques and patterned using self-assembly. This poses a considerable amount of challenge when arbitrary shapes and sizes of nanostructures are desired to be placed at precise locations. Here, we describe an alternative approach of nanoscale patterning of zinc sulfide (ZnS) directly using a spin-coatable and electron beam sensitive zinc butylxanthate resist without the lift-off or etching step.