Surface Stoichiometry and Depth Profile of Ti-CuN Thin Films Deposited by Magnetron Sputtering.

We report the surface stoichiometry of Tix-CuyNz thin film as a function of film depth. Films are deposited by high power impulse (HiPIMS) and DC magnetron sputtering (DCMS). The composition of Ti, Cu, and N in the deposited film is investigated by X-ray photoelectron spectroscopy (XPS).

Optical and Electronic Structural Properties of CuN Thin Films: A First-Principles Study (LDA + ).

A comprehensive study on the electronic structure and optical properties of a CuN film is performed by the first-principles study using density functional theory. The Hubbard () term is added in the local density approximation approach for improvement of the theoretical band gap energy. The band structure of the CuN unit cell shows a strong hybridization of Cu 3d and N 2p orbitals in the near-valence band region () because of their antibonding states which are also observed by molecular orbitals (HOMO-LUMO).