Absolute measurement of surface and bulk absorption in DUV optics from temperature induced wavefront deformation.

A measurement system for quantitative determination of both surface and bulk contributions to the photo-thermal absorption in DUV optics was developed. It is based upon a Hartmann-Shack wavefront sensor with a sensitivity of ~λ/10000 rms, accomplishing precise on-line monitoring of wavefront deformations of a collimated test laser beam transmitted perpendicular through the excimer laser-irradiated site of a cuboid sample. Caused by the temperature dependence of the refractive index as well as thermal expansion, the initially plane wavefront of the test laser is distorted into a cylindrical shape, with bending ends towards the surface.

Damage threshold measurements on EUV optics using focused radiation from a table-top laser produced plasma source.

We present first damage threshold investigations on EUV mirrors and substrate materials using a table-top laser produced plasma source. A Schwarzschild objective with Mo/Si multilayer coatings for the wavelength of 13.5 nm was adapted to the source, generating an EUV spot of 5 microm diameter with a maximum energy density of approximately 6.

Radiation damage resistance of AlGaN detectors for applications in the extreme-ultraviolet spectral range.

We report on the fabrication of aluminum gallium nitride (AlGaN) Schottky-photodiode-based detectors. AlGaN layers were grown using metal-organic chemical vapor deposition (MOCVD) on Si(111) wafers. The diodes were characterized at a wavelength of 13.