Roll-to-roll gravure (R2Rg) has become highly affiliated with printed electronics in the past few years due to its high yield of printed thin-film transistor (TFT) in active matrix devices, and to its low cost. For printing TFTs with multilayer structures, achieving a high-precision in overlay printing registration accuracy (OPRA) is a key challenge to attain the high degree of TFT integration through R2Rg. To address this challenge efficiently, a digital twin paradigm was first introduced in the R2Rg system with an aim to optimize the OPRA by developing a predictive model based on typical input variables such as web tension, nip force, and printing speed in the R2Rg system.
View Article and Find Full Text PDF