Convenient two step synthesis of Si labelled tetraalkoxysilanes.

29Si enrichment would be advantageous for many NMR studies of the structural properties of sol-gel derived materials. The required starting materials (29Si enriched alkoxysilanes), however, are expensive and difficult to provide. Here we present a scalable, reliable synthesis of 29Si enriched tetraethoxysilane starting from silicon dioxide or elemental silicon with a total yield up to 75%.

HF-(NH₄)₂S₂O₈-HCl Mixtures for HNO₃- and NOx-free Etching of Diamond Wire- and SiC-Slurry-Sawn Silicon Wafers: Reactivity Studies, Surface Chemistry, and Unexpected Pyramidal Surface Morphologies.

The wet-chemical treatment of silicon wafers is an important production step in photovoltaic and semiconductor industries. Solutions containing hydrofluoric acid, ammonium peroxodisulfate, and hydrochloric acid were investigated as novel acidic, NOx-free etching mixtures for texturization and polishing of monocrystalline silicon wafers. Etching rates as well as generated surface morphologies and properties are discussed in terms of the composition of the etching mixture.