Temperature dependencies of GaSb whiskers' resistance doped with Te to concentration of 1.7 × 10 cm were measured in temperature range 1.5-300 K.
View Article and Find Full Text PDFThis work pertains to the method for modification of silicon (Si) wafer morphology by metal-assisted chemical etching (MacEtch) technique suitable for fabrication of antireflective Si surfaces. For this purpose, we made different Au catalyst patterns on the surface of Si substrate. This modification allowed to obtain the close-packed Au nanodrop (ND) pattern that generates the nanowires (NWs) and the well-separated Au NDs, which induce the nanopore (NP) formation.
View Article and Find Full Text PDFThe magnetization and magnetoresistance of Si whiskers doped with