Spectroscopic Properties of Si-nc in SiO Films Using HFCVD.

In the present work, non-stoichiometric silicon oxide films (SiO) deposited using a hot filament chemical vapor deposition technique at short time and simple parameters of depositions are reported. This is motivated by the numerous potential applications of SiO films in areas such as optoelectronics. SiO films were characterized with different spectroscopic techniques.