Integrated optical phased array with on-chip amplification enabling programmable beam shaping.

We present an integrated optical phased array (OPA) which embeds in-line optical amplifiers and phase modulators to provide beam-forming capability with gain and beam steering in the 1465-1590 nm wavelength range. We demonstrate up to 21.5 dB net on-chip gain and up to 35.

Fullerene-assisted electron-beam lithography for pattern improvement and loss reduction in InP membrane waveguide devices.

In this Letter, we present a method to prepare a mixed electron-beam resist composed of a positive resist (ZEP520A) and C60 fullerene. The addition of C60 to the ZEP resist changes the material properties under electron beam exposure significantly. An improvement in the thermal resistance of the mixed material has been demonstrated by fabricating multimode interference couplers and coupling regions of microring resonators.