Optical Emission Imaging and Modeling Investigations of Microwave-Activated SiH/H and SiH/CH/H Plasmas.

Silicon is a known trace contaminant in diamond grown by chemical vapor deposition (CVD) methods. Deliberately Si-doped diamond is currently attracting great interest because of the attractive optical properties of the negatively charged silicon-vacancy (SiV) defect. This work reports in-depth studies of microwave-activated H plasmas containing trace (10-100 ppm) amounts of SiH, with and without a few % of CH, operating at pressures and powers relevant for contemporary diamond CVD, using a combination of experiment (spatially resolved optical emission (OE) imaging) and two-dimensional plasma chemical modeling.