Publications by authors named "Alexey Taskin"

Article Synopsis
  • Selective-area epitaxy (SAE) is a technique used to create specific shapes of thin films on pre-patterned substrates, allowing for precise control over the growth of materials.
  • This study successfully demonstrates the growth of Hall-bars and nanowires from bulk-insulating topological insulators (TIs) using SAE, which had not been reported before in this context.
  • The newly created TI nanostructures exhibit excellent transport properties and quantum behaviors, presenting opportunities for scalable fabrication of advanced topological devices.
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In a nanowire (NW) of a three-dimensional topological insulator (TI), the quantum confinement of topological surface states leads to a peculiar sub-band structure that is useful for generating Majorana bound states. Top-down fabrication of TINWs from a high-quality thin film would be a scalable technology with great design flexibility, but there has been no report on top-down-fabricated TINWs where the chemical potential can be tuned to the charge neutrality point (CNP). Here we present a top-down fabrication process for bulk-insulating TINWs etched from high-quality (BiSb)Te thin films without degradation.

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One-dimensional Majorana modes are predicated to form in Josephson junctions based on three-dimensional topological insulators (TIs). While observations of supercurrents in Josephson junctions made on bulk-insulating TI samples have been reported recently, the Fraunhofer patters observed in such TI-based Josephson junctions, which sometimes present anomalous features, are still not well-understood. Here, we report our study of highly gate-tunable TI-based Josephson junctions made of one of the most bulk-insulating TI materials, BiSbTeSe, and Al.

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