Two dynamic modes to streamline challenging atomic force microscopy measurements.

The quality of topographic images obtained using atomic force microscopy strongly depends on the accuracy of the choice of scanning parameters. When using the most common scanning method - semicontact amplitude modulation (tapping) mode, the choice of scanning parameters is quite complicated, since it requires taking into account many factors and finding the optimal balance between them. A researcher's task can be significantly simplified by introducing new scanning techniques.

Multiperiodic magnetoplasmonic gratings fabricated by the pulse force nanolithography.

We propose a novel, to the best of our knowledge, technique for magnetoplasmonic nanostructures fabrication based on the pulse force nanolithography method. It allows one to create the high-quality magnetoplasmonic nanostructures that have lower total losses than the gratings made by the electron-beam lithography. The method provides control of the surface plasmon polaritons excitation efficiency by varying the grating parameters such as the scratching depth or the number of scratches in a single period.